On the evolution of film roughness during magnetron sputtering deposition

Journal of Applied Physics

Volumn 108, Issue 9, 2010, Pages

  Turkin, A A ^a,b   Pei, Y T ^a   Shaha, K P ^a   Chen, C Q ^a   Vainshtein, D I ^a   De Hosson, J Th M ^a  

^a UNIVERSITY OF GRONINGEN   (Netherlands)

^b KHARKOV INSTITUTE OF PHYSICS AND TECHNOLOGY   (Ukraine)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFUSIONAL RELAXATION; EXPERIMENTAL DATA; FILM ROUGHNESS; FINITE SIZE; INCIDENT PARTICLES; MAGNETRON SYSTEM; MAGNETRON-SPUTTERING DEPOSITION; NONLOCAL; PULSED DC; ROUGHNESS EVOLUTION; SAMPLE HOLDERS; SHADOWING EFFECTS; SHADOWING GROWTH; SIMULATION RESULT; SPATIAL DIMENSION; STOCHASTIC DIFFUSION; SURFACE EVOLUTION;

ANGULAR DISTRIBUTION; BIOLOGY; MAGNETRON SPUTTERING; SURFACE ROUGHNESS;

SURFACE MORPHOLOGY;

EID: 78649260240     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3506681     Document Type: Article

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