SCOPUS 정보 검색 플랫폼

Volumn 3, Issue 10, 2010, Pages

Dependence of surface-loss probability of hydrogen atom on pressures in very high frequency parallel-plate capacitively coupled plasma

(5) Abe, Yusuke a Kawashima, Sho a Takeda, Keigo a Sekine, Makoto a Hori, Masaru a

a NAGOYA UNIVERSITY (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

AFTERGLOW PLASMAS; CAPACITIVELY COUPLED PLASMAS; DECAY TIME CONSTANT; HIGH-RATE DEPOSITION; HYDROGEN ATOMS; LOSS KINETICS; LOSS PROBABILITY; MICROCRYSTALLINE SILICON FILMS; PARALLEL PLATES; SILICON THIN FILM; VACUUM ULTRAVIOLETS; VERY HIGH FREQUENCY;

ABSORPTION SPECTROSCOPY; ATOMIC SPECTROSCOPY; DEPOSITION; HIGH PRESSURE EFFECTS; HYDROGEN; INDUCTIVELY COUPLED PLASMA; MICROCRYSTALLINE SILICON; PLASMA DEPOSITION; PROBABILITY; SEMICONDUCTING SILICON COMPOUNDS; ULTRAVIOLET LASERS;

ATOMS;

EID: 78549273659 PISSN: 18820778 EISSN: 18820786 Source Type: Journal
DOI: 10.1143/APEX.3.106001 Document Type: Article

Times cited : (7)

References (14)

1
- 0000505794
- P. Roca i Cabarrocas, R. Brenot, P. Bulkin, R. Vanderhaghen, B. Drévillon, and I. French: J. Appl. Phys. 86 (1999) 7079.
- (1999) J. Appl. Phys. , vol.86 , pp. 7079
- Roca I Cabarrocas, P.¹ Brenot, R.² Bulkin, P.³ Vanderhaghen, R.⁴ Drévillon, B.⁵ French, I.⁶

2
- 0031357566
- J. Meier, S. Dubail, R. Platz, P. Torres, U. Kroll, J. A. Selvan, N. P. Vaucher, C. Hof, D. Fischer, H. Keppner, R. Flückiger, A. Shah, V. Shklover, and K.-D. Ufert: Sol. Energy Mater. Sol. Cells 49 (1997) 35.
- (1997) Sol. Energy Mater. Sol. Cells , vol.49 , pp. 35
- Meier, J.¹ Dubail, S.² Platz, R.³ Torres, P.⁴ Kroll, U.⁵ Selvan, J.A.⁶ Vaucher, N.P.⁷ Hof, C.⁸ Fischer, D.⁹ Keppner, H.¹⁰ Flückiger, R.¹¹ Shah, A.¹² Shklover, V.¹³ Ufert, K.-D.¹⁴

3
- 0032179064
- L. Guo, M. Kondo, M. Fukawa, K. Saitoh, and A. Matsuda: Jpn. J. Appl. Phys. 37 (1998) L1116.
- (1998) Jpn. J. Appl. Phys. , vol.37
- Guo, L.¹ Kondo, M.² Fukawa, M.³ Saitoh, K.⁴ Matsuda, A.⁵

4
- 0344751778
- A. Matsuda: J. Non-Cryst. Solids 59-60 (1983) 767.
- (1983) J. Non-Cryst. Solids , vol.59-60 , pp. 767
- Matsuda, A.¹

5
- 0035576034
- S. Takashima, M. Hori, T. Goto, A. Kono, and K. Yoneda: J. Appl. Phys. 90 (2001) 5497.
- (2001) J. Appl. Phys. , vol.90 , pp. 5497
- Takashima, S.¹ Hori, M.² Goto, T.³ Kono, A.⁴ Yoneda, K.⁵

6
- 0035340325
- S. Takashima, M. Hori, T. Goto, and K. Yoneda: J. Appl. Phys. 89 (2001) 4727.
- (2001) J. Appl. Phys. , vol.89 , pp. 4727
- Takashima, S.¹ Hori, M.² Goto, T.³ Yoneda, K.⁴

7
- 0037112971
- N. Tanaka and K. Tachibana: J. Appl. Phys. 92 (2002) 5684.
- (2002) J. Appl. Phys. , vol.92 , pp. 5684
- Tanaka, N.¹ Tachibana, K.²

8
- 0036670743
- K. Tachibana: Plasma Sources Sci. Technol. 11 (2002) A166.
- (2002) Plasma Sources Sci. Technol. , vol.11
- Tachibana, K.¹

9
- 34547344325
- K. Takeda, Y. Kubota, S. Takashima, M. Hori, A. Serdyuchenko, M. Ito, and Y. Matsumi: J. Appl. Phys. 102 (2007) 013302.
- (2007) J. Appl. Phys. , vol.102 , pp. 013302
- Takeda, K.¹ Kubota, Y.² Takashima, S.³ Hori, M.⁴ Serdyuchenko, A.⁵ Ito, M.⁶ Matsumi, Y.⁷

10
- 0029675783
- D. Wagner, B. Dikmen, and H. F. Dobele: Rev. Sci. Instrum. 67 (1996) 1800.
- (1996) Rev. Sci. Instrum. , vol.67 , pp. 1800
- Wagner, D.¹ Dikmen, B.² Dobele, H.F.³

11
- 0026835853
- J. R. Dunlop, A. D. Tserepi, B. L. Preppernau, T. M. Cerny, and T. A. Miller: Plasma Chem. Plasma Process. 12 (1992) 89.
- (1992) Plasma Chem. Plasma Process. , vol.12 , pp. 89
- Dunlop, J.R.¹ Tserepi, A.D.² Preppernau, B.L.³ Cerny, T.M.⁴ Miller, T.A.⁵

12
- 36549093216
- P. J. Chantry: J. Appl. Phys. 62 (1987) 1141.
- (1987) J. Appl. Phys. , vol.62 , pp. 1141
- Chantry, P.J.¹

13
- 0003517855
- McGraw-Hill, New York
- R. C. Reid, J. M. Prausnitz, and T. K. Sherwood: The Properties of Gases and Liquids (McGraw-Hill, New York, 1977) p. 520.
- (1977) The Properties of Gases and Liquids , pp. 520
- Reid, R.C.¹ Prausnitz, J.M.² Sherwood, T.K.³

14
- 0003604450
- R. A. Svehla: NASA Tech. Rep. No. R-132 (1962).
- (1962) NASA Tech. Rep. No. R-132
- Svehla, R.A.¹

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.