Anisotropic edge retraction and hole growth during solid-state dewetting of single crystal nickel thin films

Acta Materialia

Volumn 59, Issue 2, 2011, Pages 582-589

  Ye, Jongpil ^a   Thompson, Carl V ^a  

^a Massachusetts Institute of Technology Cambridge   (United States)

Author keywords

Dewetting; Edge retraction; Faceting; Hole growth; Single crystal nickel thin film

Indexed keywords

ANISOTROPIC MORPHOLOGIES; COMPLEX MORPHOLOGY; CRYSTALLOGRAPHIC DIRECTIONS; CRYSTALLOGRAPHIC ORIENTATIONS; DE-WETTING; EDGE RETRACTION; ELEVATED TEMPERATURE; FACETING; HOLE GROWTH; IN-PLANE; IN-PLANE ORIENTATION; INITIAL SHAPE; NI(1 1 0); NICKEL THIN FILM; POLAR PLOT; SINGLE CRYSTAL NI; SINGLE CRYSTAL THIN FILMS; SINGLE-CRYSTAL FILMS; SURFACE ENERGIES;

ANISOTROPY; FILM GROWTH; MORPHOLOGY; NICKEL; SURFACE PHENOMENA; THIN FILMS; VAPOR DEPOSITION;

SINGLE CRYSTALS;

EID: 78449237274     PISSN: 13596454     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.actamat.2010.09.062     Document Type: Article

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