Study on W/SiC interface of SiC fiber fabricated by chemical vapor deposition on tungsten filament

Thin Solid Films

Volumn 519, Issue 4, 2010, Pages 1367-1370

  Zhang, Rong Jun ^a   Yang, Yan Qing ^a   Shen, Wen Tao ^a   Wang, Chen ^a  

^a NORTHWESTERN POLYTECHNICAL UNIVERSITY   (China)

Author keywords

Chemical vapor deposition; Interfacial reaction; Silicon carbide fibre; Transmission electron microscopy; Tungsten

Indexed keywords

DIRECT CURRENT; ELECTRON DIFFRACTION ANALYSIS; FORMATION MECHANISM; GAS SYSTEMS; INTERFACIAL REACTION ZONES; INTERFACIAL REACTIONS; SCANNING ELECTRON MICROSCOPE; SIC FIBERS; SILICON CARBIDE FIBRE; TRANSMISSION ELECTRON; TRANSMISSION ELECTRON MICROSCOPE; TUNGSTEN FILAMENTS;

ELECTRON MICROSCOPES; ELECTRONS; FIBERS; SCANNING ELECTRON MICROSCOPY; SILICON; SILICON CARBIDE; TRANSMISSION ELECTRON MICROSCOPY; TUNGSTEN; TUNGSTEN CARBIDE;

CHEMICAL VAPOR DEPOSITION;

EID: 78349308970     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.09.025     Document Type: Article

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