Thermal reaction of SiC films with tungsten and tungsten-rhenium alloys

Journal of Materials Science

Volumn 43, Issue 11, 2008, Pages 3938-3945

  Roger, Jérome ^a   Audubert, Fabienne ^b   Le Petitcorps, Yann ^a  

^a UNIVERSITÉ DE BORDEAUX   (France)

^b IRFM   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; RHENIUM ALLOYS; SILICON CARBIDE; SOLID STATE REACTIONS; TUNGSTEN ALLOYS;

HOT FILAMENT CHEMICAL VAPOUR DEPOSITION (HFCVD); THERMAL REACTIONS; TUNGSTEN-RHENIUM ALLOYS;

THIN FILMS;

EID: 43649089024     PISSN: 00222461     EISSN: 15734803     Source Type: Journal    
DOI: 10.1007/s10853-007-2334-y     Document Type: Article

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