Growth and characterization of nitrogen-doped TiO2 thin films prepared by reactive pulsed laser deposition

Thin Solid Films

Volumn 519, Issue 4, 2010, Pages 1464-1469

  Sauthier, G ^a   Ferrer, F J ^b   Figueras, A ^a   Gyorgy E ^a,c  

^a CSIC   (Spain)

^b CENTRO NACIONAL DE ACELERADORES   (Spain)

^c NATIONAL INSTITUTE FOR LASER   (Romania)

Author keywords

Doped oxides; Thin film pulsed laser deposition; Titanium oxide; X ray diffraction; X ray photoelectron spectroscopy

Indexed keywords

CHEMICAL BONDS; CRYSTAL STRUCTURE; DOPING (ADDITIVES); EXCIMER LASERS; LIGHT ABSORPTION; OXIDE MINERALS; OXYGEN; PHOTOELECTRONS; PHOTONS; PULSED LASER DEPOSITION; PULSED LASERS; SILICA; TITANIUM DIOXIDE; TITANIUM OXIDES; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

CHEMICAL BONDING STATE; DOPED OXIDES; NITROGEN CONCENTRATIONS; NITROGEN INCORPORATION; OPTICAL ABSORPTION EDGE; REACTIVE PULSED LASER DEPOSITION; TITANIUM DIOXIDES (TIO2); VISIBLE SPECTRAL RANGE;

THIN FILMS;

EID: 78349304372     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.09.043     Document Type: Article

References (51)

1. D.R. Lide Handbook of Chemistry and Physics 71st ed. 1991 CRC Boca Raton, FL
2. K. Honda, and A. Fujishima Nature 238 1972 37
3. O. Khaselev, and J.A. Turner Science 280 1998 425
4. P.G. Wu, C.H. Ma, and J.K. Shang Appl. Phys. A Mater. Sci. Process. 81 2005 1411
5. Y.P. Yu, X.J. Xing, L.M. Xu, S.X. Wu, and S.W. Li J. Appl. Phys. 105 2009 123535
6. R. Asahi, T. Morikawa, T. Ohwaki, A. Aoki, and Y. Taga Science 293 2001 269
7. Q. Li, and J.K. Shang J. Am. Ceram. Soc. 91 2008 3167
8. T. Lopez-Luke, A. Wolcott, L.P. Xu, S. Chen, Z. Wen, J. Li, E. De La Rosa, and J. Zhang J. Phys. Chem. C 112 2008 1282
9. C.W. Dunnill, and I.P. Parkin Chem. Vap. Deposition 15 2009 171
10. P. Romero-Gomez, V. Rico, A. Borras, A. Barranco, J.P. Espinos, J. Cotrino, and A.R. Gonzalez-Elipe J. Phys. Chem. C 113 2009 13341
11. N. Baguer, E. Neyts, S. Van Gils, and A. Bogaerts Chem. Vap. Deposition 14 2008 339
12. N.C. Saha, and H.G. Tompkins J. Appl. Phys. 72 1992 3072
13. C. Di Valentin, G. Pacchioni, and A. Selloni Phys. Rev. B 70 2004 085116
14. R. Long, and N.J. English Appl. Phys. Lett. 94 2009 132102
15. H. Gao, J. Zhou, D. Dai, and Y. Qu Chem. Eng. Technol. 32 2009 867
16. H. Irie, Y. Watanabe, and K. Hashimoto J. Phys. Chem. B 107 2003 5483
17. R. Nakamura, T. Tanaka, and Y. Nakato J. Phys. Chem. B 108 2004 10617
18. D.J. Mowbray, J.L. Martinez, J.M. Garcia Lastra, K.S. Thygesen, and K.W. Jacobsen J. Phys. Chem. C 113 2009 12301
19. J.Y. Lee, J. Park, and J.H. Cho Appl. Phys. Lett. 87 2005 011904
20. T. Ihara, M. Miyoshi, Y. Iriyama, O. Matsumoto, and S. Sugihara Appl. Catal. B 42 2003 403
21. B. Liu, L. Wen, and X. Zhao Sol. Energy Mater. Sol. Cells 92 2008 1
22. Z. Lin, A. Orlov, R.M. Lambert, and M.C. Payne J. Phys. Chem. B 109 2005 20948
23. G. Sauthier, E. György, and A. Figueras J. Mater. Res. 23 2008 2340
24. K. Murakami E. Fogarassy, S. Lazare, Laser Ablation of Electronic Materials - Basic Mechanisms and Applications 1992 Elsevier Amsterdam 125
25. M. Von Allmen, and A. Blatter Laser-Beam Interactions with Materials 2nd ed 1995 Springer-Verlag Berlin
26. D. Bäuerle Laser Processing and Chemistry 1996 Springer-Verlag Berlin
27. D.G. Chrisey, G.K. Hubler, Pulsed Laser Deposition of Thin Films 1994 Wiley New York
28. I.N. Mihailescu, and E. György T. Asakura, Trends in Optics and Photonics 1999 Springer Berlin p.201
29. R. Eason, Pulsed Laser Deposition of Thin Films (Wiley 2006 Hoboken New Jersey
30. T. Okato, T. Sakano, and M. Obara Phys. Rev. B 72 2005 115124
31. P. Xu, L. Mi, and P.N. Wang J. Cryst. Growth 289 2006 433
32. Y. Suda, H. Kawasaki, T. Ueda, and T. Ohshima Thin Solid Films 453-454 2004 162
33. B. Farkas, J. Budai, I. Kabalci, P. Heszler, and Zs. Geretovszky Appl. Surf. Sci. 254 2008 3484
34. T.L. Chen, Y. Hirose, T. Hitosugi, and T. Hasegawa J. Phys. D Appl. Phys. 41 2008 062005
35. M. Mayer SIMNRA, a Simulation Program for the Analysis of NRA, RBS and ERDA, in Proceedings of the 15th International Conference on the Application of Accelerators in Research and Industry J.L. Duggan, I.L. Morgan, American Institute of Physics Conference Proceedings 475, p. 541 1999
36. JC-PDS No. 21-1272 International Centre for Diffraction Data 1994 Newton Square PA
37. P. Pietro, and R.E. Kirby J. Vac. Sci. Technol. A 13 1995 2819
38. F. Esaka, K. Furuya, H. Shimada, M. Imamura, N. Matsubayashi, H. Sato, A. Nishijima, A. Kawana, H. Ishimura, and T. Kikuchi J. Vac. Sci. Technol. A 15 1997 2521
39. B.J. Burrow, A.E. Morgan, and R.C. Ellwanger J. Vac. Sci. Technol. A 4 1986 2463
40. M. Batzill, E.H. Morales, and U. Diebold Phys. Rev. Lett. 96 2006 026103
41. S.M. Prokes, J.L. Gole, X. Chen, C. Burda, and W.E. Carlos Adv. Funct. Mater. 15 2005 161
42. Y.P. Yu, X.J. Xing, L.M. Xu, S.X. Wu, and S.W. Li J. Appl. Phys. 105 2009 123535
43. V. Gupta, and A. Mansingh J. Appl. Phys. 80 1996 1063
44. T. Shibata, H. Irie, D.A. Tryk, and K. Hashimoto J. Phys. Chem. C 113 2009 12811
45. W.J. Yin, S. Chen, J.H. Yang, X.G. Gong, Y. Yan, and S.H. Wei Appl. Phys. Lett. 96 2010 221901
46. M. Härthing, and G. Fritsh Acta Mater. 44 1996 487
47. J. Tauc Amorphous and Liquid Semiconductors J. Tauc, 1974 Plenum New York 159
48. L.E. Brus J. Chem. Phys. 80 1984 4403
49. D.V. Barykin, J.M. Friedrich, and F.C. Walsh Adv. Mater. 18 2006 2807
50. J.R. Heath Science 270 1995 1315
51. Z.H. Lu, D.J. Lockwood, and J.M. Baribeau Nat. Lond. 378 1995 258