Investigation of nitrogen-doped TiO2 thin films grown by reactive pulsed laser deposition

Journal of Materials Research

Volumn 23, Issue 9, 2008, Pages 2340-2345

  Sauthier, G ^a   Gyorgy E ^a,b   Figueras, A ^c  

^a INSTITUT DE CIÈNCIA DE MATERIALS DE BARCELONA ICMAB CSIC   (Spain)

^b NATIONAL INSTITUTE FOR LASER   (Romania)

^c CSIC   (Spain)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT ABSORPTION; NEODYMIUM LASERS; PROGRAMMABLE LOGIC CONTROLLERS; PULSED LASER DEPOSITION; PULSED LASERS; SEMICONDUCTOR DOPING; SUBSTRATES; TITANIUM DIOXIDE; YTTRIUM ALUMINUM GARNET;

ANATASE PHASE TIO2 THIN FILMS; NITROGEN INCORPORATION; NITROGEN PARTIAL PRESSURES; OPTICAL ABSORPTION EDGE; REACTIVE PULSED LASER DEPOSITION; SUBSTITUTIONAL NITROGEN; TITANIUM DIOXIDES (TIO2); VISIBLE SPECTRAL RANGE;

THIN FILMS;

EID: 52649156593     PISSN: 08842914     EISSN: None     Source Type: Journal    
DOI: 10.1557/jmr.2008.0306     Document Type: Article

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