SCOPUS 정보 검색 플랫폼

Chemical Vapor Deposition

Volumn 14, Issue 11-12, 2008, Pages 339-346

Study of atmospheric MOCVD of TiO2 thin films by means of computational fluid dynamics simulations

(4) Baguer, Neyda a Neyts, Erik a Van Gils, Sake b,c Bogaerts, Annemie a

a UNIVERSITY OF ANTWERP (Belgium)

b Onderzoekscentrum voor de Aanwending van Staal (Belgium)

c FLAMAC (Flanders Materials Centre) (Belgium)

Author keywords

Atmospheric pressure; MOCVD; Simulation; TiO2 films; TTIP

Indexed keywords

ADSORPTION; ATMOSPHERIC PRESSURE; ATMOSPHERICS; CHEMICAL VAPOR DEPOSITION; CLIMATOLOGY; COMPUTATIONAL FLUID DYNAMICS; DECOMPOSITION; DYNAMICS; FLUID DYNAMICS; HYDROLYSIS; METEOROLOGY; PRESSURE; PYROLYSIS; TITANIUM; TITANIUM DIOXIDE;

CARRIER GASSES; COMPUTATIONAL FLUID DYNAMICS SIMULATIONS; COMPUTATIONAL STUDIES; DEPOSITION PROCESSES; HYDROLYSIS REACTIONS; MOCVD; ONSET TEMPERATURES; PRECURSOR CONCENTRATIONS; SIMULATION; SUBSTRATE TEMPERATURES; THERMAL DECOMPOSITIONS; TIO2 FILMS; TITANIUM TETRAISOPROPOXIDE; TTIP;

FILM GROWTH;

EID: 57849097775 PISSN: 09481907 EISSN: 15213862 Source Type: Journal
DOI: 10.1002/cvde.200806708 Document Type: Article

Times cited : (17)

References (37)

1
- 0037233037
- Surf. Sci
- 53
- U. Diebold, Surf. Sci. Reports 2003, 48, 53.
- (2003) Reports , vol.48
- Diebold, U.¹

2
- 0012483736
- J. Hewitt, Cosmet. Toiletries 1999, 114, 59.
- (1999) Cosmet. Toiletries , vol.114 , pp. 59
- Hewitt, J.¹

3
- 0038721121
- K. H. Ahn, Y. B. Park, D. W. Park, Surf. Coat. Technol. 2003, 171, 198.
- (2003) Surf. Coat. Technol , vol.171 , pp. 198
- Ahn, K.H.¹ Park, Y.B.² Park, D.W.³

4
- 0035382260
- K. Vydianathan, G. Nuesca, G. Peterson, E. T. Eisenbraun, A. E. Kaloyeros, J. Mater. Res. 2001, 16, 1838.
- (2001) J. Mater. Res , vol.16 , pp. 1838
- Vydianathan, K.¹ Nuesca, G.² Peterson, G.³ Eisenbraun, E.T.⁴ Kaloyeros, A.E.⁵

5
- 0032071132
- A. Goosens, E. L. Maloney, J. Schoonman, Chem. Vap. Deposition 1998, 4, 109.
- (1998) Chem. Vap. Deposition , vol.4 , pp. 109
- Goosens, A.¹ Maloney, E.L.² Schoonman, J.³

6
- 0037696429
- I. K. Konstantinou, T. A. Albanis, Appl. Catal. B: Environ. 2003, 42, 319.
- (2003) Appl. Catal. B: Environ , vol.42 , pp. 319
- Konstantinou, I.K.¹ Albanis, T.A.²

7
- 0037162940
- A. Mills, N. Elliot, I. P. Parkin, S. A. O'Neill, R. J. Clark, J. Photochem. Photobiol. A: Chem. 2002, 151, 171.
- (2002) J. Photochem. Photobiol. A: Chem , vol.151 , pp. 171
- Mills, A.¹ Elliot, N.² Parkin, I.P.³ O'Neill, S.A.⁴ Clark, R.J.⁵

8
- 0037435561
- S. A. O'Neill, R. J. Clark, I. P. Parkin, N. Elliot, A. Mills, Chem. Mater. 2003, 15, 46.
- (2003) Chem. Mater , vol.15 , pp. 46
- O'Neill, S.A.¹ Clark, R.J.² Parkin, I.P.³ Elliot, N.⁴ Mills, A.⁵

9
- 4344685311
- J. T. Brown, Appl. Opt. 2004, 43, 4506.
- (2004) Appl. Opt , vol.43 , pp. 4506
- Brown, J.T.¹

10
- 0028452766
- T. Fujii, N. Sakata, J. Takada, Y. Miura, Y. Daitoh, M. Takano, J. Mater. Res. 1994, 9, 1468.
- (1994) J. Mater. Res , vol.9 , pp. 1468
- Fujii, T.¹ Sakata, N.² Takada, J.³ Miura, Y.⁴ Daitoh, Y.⁵ Takano, M.⁶

11
- 0002179435
- A. Rathu, M. Ritala, Chem. Vap. Deposition 2002, 8, 21.
- (2002) Chem. Vap. Deposition , vol.8 , pp. 21
- Rathu, A.¹ Ritala, M.²

12
- 0037156085
- S. I. Cho, C. H. Chung, S. H. Moon, Thin Solid Films 2002, 409, 98.
- (2002) Thin Solid Films , vol.409 , pp. 98
- Cho, S.I.¹ Chung, C.H.² Moon, S.H.³

13
- 0027610749
- H. Y. Lee, H. G. Kim, Thin Solid Films 1993, 229, 187.
- (1993) Thin Solid Films , vol.229 , pp. 187
- Lee, H.Y.¹ Kim, H.G.²

14
- 0025398961
- K. L. Siefering, G. L. Griffin, J. Electrochem. Soc. 1990, 137, 814.
- (1990) J. Electrochem. Soc , vol.137 , pp. 814
- Siefering, K.L.¹ Griffin, G.L.²

15
- 11344261785
- U. Backman, A. Auvinen, J. K. Jokiniemi, Surf. Coat. Technol. 2005, 192, 81.
- (2005) Surf. Coat. Technol , vol.192 , pp. 81
- Backman, U.¹ Auvinen, A.² Jokiniemi, J.K.³

16
- 0035500933
- D. J. Won, C. H. Wang, H. K. Jang, D. J. Choi, Appl. Phys. A 2001, 73, 595.
- (2001) Appl. Phys. A , vol.73 , pp. 595
- Won, D.J.¹ Wang, C.H.² Jang, H.K.³ Choi, D.J.⁴

17
- 0032496477
- P. Babelon, A. S. Dequiedt, H. Mostefa, S. Bourgeois, P. Sibillot, M. Sacilotti, Thin Solid Films 1997, 322, 63.
- (1997) Thin Solid Films , vol.322 , pp. 63
- Babelon, P.¹ Dequiedt, A.S.² Mostefa, H.³ Bourgeois, S.⁴ Sibillot, P.⁵ Sacilotti, M.⁶

18
- 57849157537
- FLUENT
- FLUENT, http://www.fluent.com.

19
- 57849106837
- F. D. Dominica, Surf. Coat. Technol. 2004, 188-189, 225.
- (2004) Surf. Coat. Technol , vol.188-189 , pp. 225
- Dominica, F.D.¹

20
- 0029347228
- T. Seto, M. Shimada, K. Okuyama, Aerosol Sci. Technol. 1995, 23, 183.
- (1995) Aerosol Sci. Technol , vol.23 , pp. 183
- Seto, T.¹ Shimada, M.² Okuyama, K.³

21
- 57849133663
- S. Krumdieck, Acta Mater. 2001, 49, 853.
- (2001) Acta Mater , vol.49 , pp. 853
- Krumdieck, S.¹

22
- 0031546344
- Z. Nami, O. Misman, A. Erbil, G. S. May, J. Cryst. Growth 1997, 171, 154.
- (1997) J. Cryst. Growth , vol.171 , pp. 154
- Nami, Z.¹ Misman, O.² Erbil, A.³ May, G.S.⁴

23
- 34547756352
- E. Neyts, A. Bogaerts, M. De Meyer, S. Van Gils, Surf. Coat. Technol. 2007, 201, 8838.
- (2007) Surf. Coat. Technol , vol.201 , pp. 8838
- Neyts, E.¹ Bogaerts, A.² De Meyer, M.³ Van Gils, S.⁴

24
- 0025404370
- O. Okuyama, R. Ushio, Y. Kousaka, R. Flagan, J. Seinfeld, AIChE J. 1990, 36, 409.
- (1990) AIChE J , vol.36 , pp. 409
- Okuyama, O.¹ Ushio, R.² Kousaka, Y.³ Flagan, R.⁴ Seinfeld, J.⁵

25
- 0003692937
- Eds: M. Allendorf, C. Bernard, The Electrochemical Soc, Pennington NJ
- G. A. Battiston, R. Gerbasi, M. Porchia, A. Gasparoto, in Chemical Vapor Deposition-Proc. 14th Int. CVD Conf. and EUROCVD-11, Vol. 97-25(Eds: M. Allendorf, C. Bernard), The Electrochemical Soc., Pennington NJ 1997, p. 660.
- (1997) Chemical Vapor Deposition-Proc. 14th Int. CVD Conf. and EUROCVD-11 , vol.97 -25 , pp. 660
- Battiston, G.A.¹ Gerbasi, R.² Porchia, M.³ Gasparoto, A.⁴

26
- 0003837914
- Longman, Malaysia
- H. K. Versteeg, W. Malalasekera, An Introduction to Computational Fluid Dynamics: The Finite Volume Method, Longman, Malaysia 1998.
- (1998) An Introduction to Computational Fluid Dynamics: The Finite Volume Method
- Versteeg, H.K.¹ Malalasekera, W.²

27
- 84968510911
- A. J. Chorin, Math. Comp. 1968, 22, 745.
- (1968) Math. Comp , vol.22 , pp. 745
- Chorin, A.J.¹

28
- 0003500930
- McGraw-Hill, New York
- S. V. Patankar, Numerical Heat Transfer and Fluid Flow, McGraw-Hill, New York 1986.
- (1986) Numerical Heat Transfer and Fluid Flow
- Patankar, S.V.¹

29
- 57849152154
- Sciences Meeting
- Technical Report AIEA-89-0366, AIAA 27th Aerospace Space, Reno, Nevada
- T. J. Barth, D. Jespersen, Technical Report AIEA-89-0366, AIAA 27th Aerospace Space Sciences Meeting, Reno, Nevada, 1989.
- (1989)
- Barth, T.J.¹ Jespersen, D.²

30
- 84877205634
- FLUENT 6.3 User's Guide Manual, Chapter 14, http://www.fluent.com.
- FLUENT 6.3 User's Guide Manual

31
- 0003840273
- McGraw-Hill, New York
- D. L. Smith, Thin-Film Deposition: Principles and Practice, McGraw-Hill, New York 1995.
- (1995) Thin-Film Deposition: Principles and Practice
- Smith, D.L.¹

32
- 33646352430
- S. Chen, M. G. Mason, H. J. Gysling, G. R. Paz-Pujalt, J. Vac. Sci. Technol. A 1993, 11, 2419.
- (1993) J. Vac. Sci. Technol. A , vol.11 , pp. 2419
- Chen, S.¹ Mason, M.G.² Gysling, H.J.³ Paz-Pujalt, G.R.⁴

33
- 0001911622
- H. Komiyama, T. Kanai, H. Inoue, Chem. Lett. 1984, 8, 1283.
- (1984) Chem. Lett , vol.8 , pp. 1283
- Komiyama, H.¹ Kanai, T.² Inoue, H.³

34
- 0036600595
- S. Tsantilis, H. K. Kammler, S. E. Pratsinis, Chem. Eng. Sci. 2002, 57, 2139.
- (2002) Chem. Eng. Sci , vol.57 , pp. 2139
- Tsantilis, S.¹ Kammler, H.K.² Pratsinis, S.E.³

35
- 0003477452
- William Andrew, New York
- H. O. Pierson, Handbook of Chemical Vapor Deposition: Principles, Technologies and Applications, William Andrew, New York 1999.
- (1999) Handbook of Chemical Vapor Deposition: Principles, Technologies and Applications
- Pierson, H.O.¹

36
- 0025416386
- M. Okada, K. Tominaga, T. Araki, S. Katayama, Y. Sakashita, Jpn. J. Appl. Phys. 1990, 29, 718.
- (1990) Jpn. J. Appl. Phys , vol.29 , pp. 718
- Okada, M.¹ Tominaga, K.² Araki, T.³ Katayama, S.⁴ Sakashita, Y.⁵

37
- 14644413247
- W. Haenni, H. E. Hintermann, D. Morel, A. Simmen, J. Phys. Coll. 1989, C5, 401.
- (1989) J. Phys. Coll , vol.C5 , pp. 401
- Haenni, W.¹ Hintermann, H.E.² Morel, D.³ Simmen, A.⁴

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