Chemical mechanical polishing of a Ti-Si-N nanocomposite and AFM study on its nanostructure

Journal of the Korean Physical Society

Volumn 57, Issue 41, 2010, Pages 845-849

  Lee, Hyunseop ^a   Kim, Doo In ^a   Jeong, Haedo ^a   Kim, Kwang Ho ^a  

^a Pusan National University   (South Korea)

Author keywords

Atomic force microscope (AFM); Chemical mechanical polishing (CMP); Phase shift; Tapping mode AFM; Ti Si N nanocomposite

Indexed keywords

EID: 78149437335     PISSN: 03744884     EISSN: None     Source Type: Journal    
DOI: 10.3938/jkps.57.845     Document Type: Article

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