-
2
-
-
55749112499
-
-
ADVMEW 0935-9648,. 10.1002/adma.200800338
-
S. I. Na, S. S. Kim, J. Jo, and D. Y. Kim, Adv. Mater. ADVMEW 0935-9648 20, 4061 (2008). 10.1002/adma.200800338
-
(2008)
Adv. Mater.
, vol.20
, pp. 4061
-
-
Na, S.I.1
Kim, S.S.2
Jo, J.3
Kim, D.Y.4
-
3
-
-
11944258963
-
-
SCIEAS 0036-8075,. 10.1126/science.258.5087.1474
-
N. S. Sariciftci, L. Smilowitz, A. J. Heeger, and F. Wudl, Science SCIEAS 0036-8075 258, 1474 (1992). 10.1126/science.258.5087.1474
-
(1992)
Science
, vol.258
, pp. 1474
-
-
Sariciftci, N.S.1
Smilowitz, L.2
Heeger, A.J.3
Wudl, F.4
-
4
-
-
27344431891
-
-
CMATEX 0897-4756,. 10.1021/cm051320q
-
F. C. Krebs and H. Spanggaard, Chem. Mater. CMATEX 0897-4756 17, 5235 (2005). 10.1021/cm051320q
-
(2005)
Chem. Mater.
, vol.17
, pp. 5235
-
-
Krebs, F.C.1
Spanggaard, H.2
-
5
-
-
38649132347
-
-
THSFAP 0040-6090,. 10.1016/j.tsf.2007.03.082
-
T. Minami, Thin Solid Films THSFAP 0040-6090 516, 1314 (2008). 10.1016/j.tsf.2007.03.082
-
(2008)
Thin Solid Films
, vol.516
, pp. 1314
-
-
Minami, T.1
-
6
-
-
17044403452
-
-
SSTEET 0268-1242,. 10.1088/0268-1242/20/4/004
-
T. Minami, Semicond. Sci. Technol. SSTEET 0268-1242 20, S35 (2005). 10.1088/0268-1242/20/4/004
-
(2005)
Semicond. Sci. Technol.
, vol.20
, pp. 35
-
-
Minami, T.1
-
7
-
-
33846456582
-
-
APPLAB 0003-6951,. 10.1063/1.2432951
-
J. Owen, M. S. Son, K. H. Yoo, B. D. Ahn, and S. Y. Lee, Appl. Phys. Lett. APPLAB 0003-6951 90, 033512 (2007). 10.1063/1.2432951
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 033512
-
-
Owen, J.1
Son, M.S.2
Yoo, K.H.3
Ahn, B.D.4
Lee, S.Y.5
-
8
-
-
33747362897
-
-
JAPIAU 0021-8979,. 10.1063/1.2218466
-
V. Bhosle, A. Tiwari, and J. Narayan, J. Appl. Phys. JAPIAU 0021-8979 100, 033713 (2006). 10.1063/1.2218466
-
(2006)
J. Appl. Phys.
, vol.100
, pp. 033713
-
-
Bhosle, V.1
Tiwari, A.2
Narayan, J.3
-
9
-
-
66549093240
-
-
APPLAB 0003-6951,. 10.1063/1.3142423
-
G. B. Murdoch, S. Hinds, E. H. Sargent, S. W. Tsang, L. Mordoukhovski, and Z. H. Lu, Appl. Phys. Lett. APPLAB 0003-6951 94, 213301 (2009). 10.1063/1.3142423
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 213301
-
-
Murdoch, G.B.1
Hinds, S.2
Sargent, E.H.3
Tsang, S.W.4
Mordoukhovski, L.5
Lu, Z.H.6
-
10
-
-
33745725539
-
-
JAPIAU 0021-8979,. 10.1063/1.2206417
-
B. Y. Oh, M. C. Jeong, T. H. Moon, W. Lee, J. M. Myoung, J. Y. Hwang, and D. S. Seo, J. Appl. Phys. JAPIAU 0021-8979 99, 124505 (2006). 10.1063/1.2206417
-
(2006)
J. Appl. Phys.
, vol.99
, pp. 124505
-
-
Oh, B.Y.1
Jeong, M.C.2
Moon, T.H.3
Lee, W.4
Myoung, J.M.5
Hwang, J.Y.6
Seo, D.S.7
-
11
-
-
69949172824
-
-
SEMCEQ 0927-0248,. 10.1016/j.solmat.2009.07.016
-
H. K. Park, J. W. Kang, S. I. Na, D. Y. Kim, and H. K. Kim, Sol. Energy Mater. Sol. Cells SEMCEQ 0927-0248 93, 1994 (2009). 10.1016/j.solmat.2009.07.016
-
(2009)
Sol. Energy Mater. Sol. Cells
, vol.93
, pp. 1994
-
-
Park, H.K.1
Kang, J.W.2
Na, S.I.3
Kim, D.Y.4
Kim, H.K.5
-
12
-
-
65649134779
-
-
THSFAP 0040-6090,. 10.1016/j.tsf.2009.02.138
-
H. K. Park, J. A. Jeong, Y. S. Park, W. J. Cho, and H. K. Kim, Thin Solid Films THSFAP 0040-6090 517, 5563 (2009). 10.1016/j.tsf.2009.02.138
-
(2009)
Thin Solid Films
, vol.517
, pp. 5563
-
-
Park, H.K.1
Jeong, J.A.2
Park, Y.S.3
Cho, W.J.4
Kim, H.K.5
-
13
-
-
33748787943
-
-
CMATEX 0897-4756,. 10.1021/cm061032+
-
X. Crispin, F. L. E. Jakobsson, A. Crispin, P. C. M. Grim, P. Andersson, A. Volodin, C. van Haesendonck, M. Van der Auweraer, W. R. Salaneck, and M. Berggren, Chem. Mater. CMATEX 0897-4756 18, 4354 (2006). 10.1021/cm061032+
-
(2006)
Chem. Mater.
, vol.18
, pp. 4354
-
-
Crispin, X.1
Jakobsson, F.L.E.2
Crispin, A.3
Grim, P.C.M.4
Andersson, P.5
Volodin, A.6
Van Haesendonck, C.7
Van Der Auweraer, M.8
Salaneck, W.R.9
Berggren, M.10
-
14
-
-
45749141327
-
-
ZZZZZZ 0967-3334,. 10.1088/0967-3334/29/6/S18
-
G. Gabriel, R. Gomez-Martinez, and R. Villa, Physiol. Meas ZZZZZZ 0967-3334 29, S203 (2008). 10.1088/0967-3334/29/6/S18
-
(2008)
Physiol. Meas
, vol.29
, pp. 203
-
-
Gabriel, G.1
Gomez-Martinez, R.2
Villa, R.3
-
15
-
-
70349653753
-
-
NNOTER 0957-4484,. 10.1088/0957-4484/20/43/434007
-
Y. Liang, J. Frisch, L. Zhi, H. Norouzi-Arasi, X. Feng, J. P. Rabe, N. Koch, and K. Mullen, Nanotechnology NNOTER 0957-4484 20, 434007 (2009). 10.1088/0957-4484/20/43/434007
-
(2009)
Nanotechnology
, vol.20
, pp. 434007
-
-
Liang, Y.1
Frisch, J.2
Zhi, L.3
Norouzi-Arasi, H.4
Feng, X.5
Rabe, J.P.6
Koch, N.7
Mullen, K.8
-
16
-
-
24344495384
-
-
APPLAB 0003-6951,. 10.1063/1.1949728
-
Y. Furubayashi, T. Hitosugi, Y. Yamamoto, K. Inaba, G. Kinoda, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. APPLAB 0003-6951 86, 252101 (2005). 10.1063/1.1949728
-
(2005)
Appl. Phys. Lett.
, vol.86
, pp. 252101
-
-
Furubayashi, Y.1
Hitosugi, T.2
Yamamoto, Y.3
Inaba, K.4
Kinoda, G.5
Hirose, Y.6
Shimada, T.7
Hasegawa, T.8
-
17
-
-
34248550154
-
-
JAPIAU 0021-8979,. 10.1063/1.2721748
-
Y. Furubayashi, N. Yamada, Y. Hirose, Y. Yamamoto, M. Otani, T. Hitosugi, T. Shimada, and T. Hasegawa, J. Appl. Phys. JAPIAU 0021-8979 101, 093705 (2007). 10.1063/1.2721748
-
(2007)
J. Appl. Phys.
, vol.101
, pp. 093705
-
-
Furubayashi, Y.1
Yamada, N.2
Hirose, Y.3
Yamamoto, Y.4
Otani, M.5
Hitosugi, T.6
Shimada, T.7
Hasegawa, T.8
-
18
-
-
34548670075
-
-
APPLAB 0003-6951,. 10.1063/1.2785152
-
S. X. Zhang, S. Dhar, W. Yu, H. Xu, S. B. Ogale, and T. Venkatesan, Appl. Phys. Lett. APPLAB 0003-6951 91, 112113 (2007). 10.1063/1.2785152
-
(2007)
Appl. Phys. Lett.
, vol.91
, pp. 112113
-
-
Zhang, S.X.1
Dhar, S.2
Yu, W.3
Xu, H.4
Ogale, S.B.5
Venkatesan, T.6
-
19
-
-
33847120261
-
-
JAPIAU 0021-8979,. 10.1063/1.2434005
-
M. A. Gillispie, M. F. A. M. V. Hest, M. S. Dabney, J. D. Perkins, and D. S. Ginley, J. Appl. Phys. JAPIAU 0021-8979 101, 033125 (2007). 10.1063/1.2434005
-
(2007)
J. Appl. Phys.
, vol.101
, pp. 033125
-
-
Gillispie, M.A.1
Hest, M.F.A.M.V.2
Dabney, M.S.3
Perkins, J.D.4
Ginley, D.S.5
-
20
-
-
28044432801
-
-
THSFAP 0040-6090,. 10.1016/j.tsf.2005.08.245
-
Y. Furubayashi, T. Hitosugi, Y. Yamamoto, Y. Hirose, G. Kinoda, K. Inaba, T. Shimada, and T. Hasegawa, Thin Solid Films THSFAP 0040-6090 496, 157 (2006). 10.1016/j.tsf.2005.08.245
-
(2006)
Thin Solid Films
, vol.496
, pp. 157
-
-
Furubayashi, Y.1
Hitosugi, T.2
Yamamoto, Y.3
Hirose, Y.4
Kinoda, G.5
Inaba, K.6
Shimada, T.7
Hasegawa, T.8
-
21
-
-
77949674920
-
-
ESLEF6 1099-0062,. 10.1149/1.3313361
-
J. H. Park, H. K. Kim, H. S. Lee, H. S. Lee, S. Y. Yoon, and C. D. Kim, Electrochem. Solid-State Lett. ESLEF6 1099-0062 13, J53 (2010). 10.1149/1.3313361
-
(2010)
Electrochem. Solid-State Lett.
, vol.13
, pp. 53
-
-
Park, J.H.1
Kim, H.K.2
Lee, H.S.3
Lee, H.S.4
Yoon, S.Y.5
Kim, C.D.6
-
22
-
-
44249103490
-
-
THSFAP 0040-6090,. 10.1016/j.tsf.2007.10.028
-
T. Hitosugi, A. Ueda, S. Nakao, N. Yamada, Y. Furubayashim, Y. hirose, S. Konuma, T. Shimada, and T. Hasegawa, Thin Solid Films THSFAP 0040-6090 516, 5750 (2008). 10.1016/j.tsf.2007.10.028
-
(2008)
Thin Solid Films
, vol.516
, pp. 5750
-
-
Hitosugi, T.1
Ueda, A.2
Nakao, S.3
Yamada, N.4
Furubayashim, Y.5
Hirose, Y.6
Konuma, S.7
Shimada, T.8
Hasegawa, T.9
-
23
-
-
34249748455
-
-
APPLAB 0003-6951,. 10.1063/1.2742310
-
T. Hitosugi, A. Ueda, S. Nakao, N. Yamada, Y. Furubayashi, Y. Hirose, T. Shimada, and T. Hasegawa, Appl. Phys. Lett. APPLAB 0003-6951 90, 212106 (2007). 10.1063/1.2742310
-
(2007)
Appl. Phys. Lett.
, vol.90
, pp. 212106
-
-
Hitosugi, T.1
Ueda, A.2
Nakao, S.3
Yamada, N.4
Furubayashi, Y.5
Hirose, Y.6
Shimada, T.7
Hasegawa, T.8
-
24
-
-
36749121552
-
-
APPLAB 0003-6951,. 10.1063/1.1655364
-
J. C. C. Fan, F. J. Bachner, G. H. Foley, and P. M. Zavracky, Appl. Phys. Lett. APPLAB 0003-6951 25, 693 (1974). 10.1063/1.1655364
-
(1974)
Appl. Phys. Lett.
, vol.25
, pp. 693
-
-
Fan, J.C.C.1
Bachner, F.J.2
Foley, G.H.3
Zavracky, P.M.4
-
25
-
-
84985574466
-
-
PHSSAK 0031-8957,. 10.1002/pssb.19660150224
-
J. Tauc, R. Grigorvici, and Y. Yanca, Phys. Status Solidi PHSSAK 0031-8957 15, 627 (1966). 10.1002/pssb.19660150224
-
(1966)
Phys. Status Solidi
, vol.15
, pp. 627
-
-
Tauc, J.1
Grigorvici, R.2
Yanca, Y.3
-
26
-
-
33646202250
-
-
PHRVAO 0031-899X,. 10.1103/PhysRev.93.632
-
E. Burstein, Phys. Rev. PHRVAO 0031-899X 93, 632 (1954). 10.1103/PhysRev.93.632
-
(1954)
Phys. Rev.
, vol.93
, pp. 632
-
-
Burstein, E.1
-
27
-
-
34547220431
-
-
JAPIAU 0021-8979,. 10.1063/1.2750407
-
S. X. Zhang, D. C. Kundaliya, W. Yu, S. Dhar, S. Y. Young, L. G. Salamanca-Riba, S. B. Ogale, R. D. Vispute, and T. Venkatesan, J. Appl. Phys. JAPIAU 0021-8979 102, 013701 (2007). 10.1063/1.2750407
-
(2007)
J. Appl. Phys.
, vol.102
, pp. 013701
-
-
Zhang, S.X.1
Kundaliya, D.C.2
Yu, W.3
Dhar, S.4
Young, S.Y.5
Salamanca-Riba, L.G.6
Ogale, S.B.7
Vispute, R.D.8
Venkatesan, T.9
-
28
-
-
0016992850
-
-
JAPIAU 0021-8979,. 10.1063/1.323240
-
G. Haacke, J. Appl. Phys. JAPIAU 0021-8979 47, 4086 (1976). 10.1063/1.323240
-
(1976)
J. Appl. Phys.
, vol.47
, pp. 4086
-
-
Haacke, G.1
-
29
-
-
0032482832
-
-
THSFAP 0040-6090,. 10.1016/S0040-6090(98)00520-3
-
M. Bender, W. Seelig, C. Daube, H. Frankenberger, B. Ocker, and J. Stollenwerk, Thin Solid Films THSFAP 0040-6090 326, 67 (1998). 10.1016/S0040-6090(98)00520-3
-
(1998)
Thin Solid Films
, vol.326
, pp. 67
-
-
Bender, M.1
Seelig, W.2
Daube, C.3
Frankenberger, H.4
Ocker, B.5
Stollenwerk, J.6
|