Growth of thin epitaxial alumina films onto Ni(111): An electron spectroscopy and diffraction study

Surface and Interface Analysis

Volumn 42, Issue 10-11, 2010, Pages 1581-1584

  Nemsak, Slavomir ^a   Skala, Tomas ^b   Yoshitake, Michiko ^a   Tsud, Nataliya ^c   Kim, Taeyoung ^a   Yagyu, Shinjiro ^a   Matolin, Vladimir ^c  

^a NATIONAL INSTITUTE FOR MATERIALS SCIENCE   (Japan)

^b SINCROTRONE TRIESTE   (Italy)

^c CHARLES UNIVERSITY   (Czech Republic)

Author keywords

Alumina; Aluminum oxide; LEED; Ni; Thin layer; XPS

Indexed keywords

ALUMINUM OXIDE; LEED; NI; THIN LAYERS; XPS;

ALUMINA; ALUMINUM; DIFFRACTION; ELECTRON SPECTROSCOPY; EPITAXIAL FILMS; FILM PREPARATION; LEAD OXIDE; NICKEL OXIDE; OXIDATION; OXYGEN; PHOTOELECTRICITY; PHOTONS; X RAY PHOTOELECTRON SPECTROSCOPY;

OXIDE FILMS;

EID: 78049327214     PISSN: 01422421     EISSN: 10969918     Source Type: Journal    
DOI: 10.1002/sia.3582     Document Type: Conference Paper

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