Combinatorial investigation of Hf-Ta thin films and their anodic oxides

Electrochimica Acta

Volumn 55, Issue 27, 2010, Pages 7884-7891

  Mardare, Andrei Ionut ^a,b   Ludwig, Alfred ^c   Savan, Alan ^c   Wieck, Andreas Dirk ^c   Hassel, Achim Walter ^a,b  

^a MAX PLANCK INSTITUT FÜR EISENFORSCHUNG GMBH   (Germany)

^b JOHANNES KEPLER UNIVERSITY LINZ   (Austria)

^c RUHR UNIVERSITY BOCHUM   (Germany)

Author keywords

Anodic oxide film; Combinatorial libraries; High throughput experimentation; Scanning droplet cell

Indexed keywords

AMORPHOUS REGIONS; ANODIC OXIDE FILM; ANODIC OXIDES; ANODISATION; AUTOMATED SCANNING; CO-SPUTTERING TECHNIQUES; COMBINATORIAL LIBRARY; COMPOSITION RANGES; DEPTH PROFILE; DIELECTRIC CONSTANTS; ELECTRICAL PROPERTY; HIGH THROUGHPUT EXPERIMENTATION; IMPEDANCE SPECTROSCOPY; IN-SITU; LOCAL OXIDATION; METALLIC ALLOYS; OXIDE COMPOSITIONS; OXIDE FORMATION; PARENT METAL; POTENTIODYNAMICS; SCANNING DROPLET CELL; SEM; THIN FILM COMBINATORIAL LIBRARIES; XPS; XRD;

ALLOYING; AMORPHOUS ALLOYS; CRYSTALLOGRAPHY; DROP FORMATION; ELECTRIC PROPERTIES; EXPERIMENTS; HAFNIUM; LIBRARIES; MICROSTRUCTURE; SCANNING; TANTALUM; THIN FILMS;

OXIDE FILMS;

EID: 77958112112     PISSN: 00134686     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.electacta.2010.03.066     Document Type: Conference Paper

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