Preparation of polycrystalline VO2 films on glass and TiO 2/glass substrates by means of excimer laser assisted metal organic deposition

Journal of the Ceramic Society of Japan

Volumn 118, Issue 1381, 2010, Pages 788-791

  Nishikawa, Masami ^a   Nakajima, Tomohiko ^b   Manabe, Takaaki ^b   Okutani, Takeshi ^a   Tsuchiya, Tetsuo ^b  

^a YOKOHAMA NATIONAL UNIVERSITY   (Japan)

^b NATIONAL INSTITUTE OF ADVANCED INDUSTRIAL SCIENCE AND TECHNOLOGY AIST   (Japan)

Author keywords

Film; KrF; Laser; MOD

Indexed keywords

DEPOSITION; EXCIMER LASERS; FILMS; GLASS; LASERS; METAL INSULATOR BOUNDARIES; METAL INSULATOR TRANSITION; ORGANIC LASERS; ORGANOMETALLICS; PHOTOCHEMICAL REACTIONS; SEMICONDUCTOR INSULATOR BOUNDARIES; SUBSTRATES; TITANIUM DIOXIDE;

ATMOSPHERE CONTROLS; GLASS SUBSTRATES; IRRADIATION TIME; METAL ORGANIC DEPOSITION; METAL ORGANIC DEPOSITION PROCESS; RESISTIVITY DROP; SILICA GLASS SUBSTRATE; VANADIUM DIOXIDE;

FILM PREPARATION;

EID: 77958111003     PISSN: 18820743     EISSN: 13486535     Source Type: Journal    
DOI: 10.2109/jcersj2.118.788     Document Type: Article

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