Improvement of PMMA electron-beam lithography performance in metal liftoff through a poly-imide bi-layer system

Microelectronic Engineering

Volumn 87, Issue 12, 2010, Pages 2629-2632

  Yaghmaie, F ^c   Fleck, J ^a,b   Gusman, A ^c   Prohaska, R ^c  

^a University of California   (United States)

^b UNIVERSITY OF CALIFORNIA   (United States)

^c NONE

Author keywords

Electron beam lithography; Imaging; Line edge; Lithography; Metal deposition; Metallization; Pattern transfer; Resolution; Roughness

Indexed keywords

ELECTRON BEAMS; ESTERS; IMAGING TECHNIQUES; LITHOGRAPHY; METALLIZING; METALS; OPTICAL RESOLVING POWER; SURFACE ROUGHNESS;

LIFTOFF TECHNIQUE; LINE EDGE; LINE EDGE ROUGHNESS; METAL DEPOSITION; METALLIC FEATURE; PATTERN TRANSFERS; POLY(METHYL METHACRYLATE) (PMMA); STANDARD PROBLEMS;

ELECTRON BEAM LITHOGRAPHY;

EID: 77958075720     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.07.030     Document Type: Article

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