Continuous roll-to-flat thermal imprinting process for large-area micro-pattern replication on polymer substrate

Microelectronic Engineering

Volumn 87, Issue 12, 2010, Pages 2596-2601

  Lan, Shuhuai ^a,b   Song, Jung Han ^b   Lee, Moon G ^c   Ni, Jun ^d   Lee, Nak Kyu ^b   Lee, Hye Jin ^b  

^a SHANGHAI JIAO TONG UNIVERSITY   (China)

^b Korea Institute of Industrial Technology   (South Korea)

^c Ajou University   (South Korea)

^d The Department of Civil and Environmental Engineering   (United States)

Author keywords

Analytical model; Continuous roller pressing; Large area; Pattern replication; Polymer substrate

Indexed keywords

ANALYTICAL MODELS; NAVIER STOKES EQUATIONS; POLYMERS; PRESSURE DISTRIBUTION; ROLLERS (MACHINE COMPONENTS);

BATCH-WISE PROCESS; CONTROL PARAMETERS; IMPRINTING PROCESS; LARGE AREA; LOADING PRESSURES; PATTERN REPLICATION; POLYMER SUBSTRATE; ROLLER PRESSING;

PROCESS CONTROL;

EID: 77958072043     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2010.07.021     Document Type: Article

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