Bias dependence of apparent layer thickness and moiré pattern on Nacl/Cu(001)

Surface Science

Volumn 604, Issue 19-20, 2010, Pages 1820-1824

  Guo, Qinmin ^a,b   Qin, Zhihui ^a   Liu, Cunding ^a,b   Zang, Kan ^a,b   Yu, Yinghui ^a   Cao, Gengyu ^a  

^a Wuhan National Laboratory for Optoelectronics   (China)

^b UNIVERSITY OF CHINESE ACADEMY OF SCIENCES   (China)

Author keywords

Image potential states; Moir pattern; NaCl layer; Scanning tunneling microscopy

Indexed keywords

COPPER; LATTICE MISMATCH; RESONANT TUNNELING;

BIAS DEPENDENCE; IMAGE POTENTIAL STATE; LAYER THICKNESS; NACL LAYER; SCANNING TUNNELING MICROSCOPY/SPECTROSCOPY; STM/STS;

SCANNING TUNNELING MICROSCOPY;

EID: 77958071464     PISSN: 00396028     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.susc.2010.07.013     Document Type: Article

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