Advanced mask aligner lithography: New illumination system

Optics Express

Volumn 18, Issue 20, 2010, Pages 20968-20978

  Voelkel, Reinhard ^a   Vogler, Uwe ^a   Bich, Andreas ^a   Pernet, Pascal ^a   Weible, Kenneth J ^a   Hornung, Michael ^b   Zoberbier, Ralph ^b   Cullmann, Elmar ^b   Stuerzebecher, Lorenz ^c   Harzendorf, Torsten ^c   Zeitner, Uwe D ^c  

^a SUSS MICROOPTICS SA   (Switzerland)

^b SUSS MicroTec Lithography GmbH   (United States)

^c FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

LIGHT SOURCES; LITHOGRAPHY; SPECTRUM ANALYSIS;

ANGULAR SPECTRA; CUSTOMIZED ILLUMINATION; DIFFRACTION EFFECTS; FOURIER PLANES; ILLUMINATION LIGHT; ILLUMINATION SYSTEM; MASK OPTIMIZATION; MICRO-LENS; OPTICAL PROXIMITY CORRECTIONS; RESOLUTION ENHANCEMENT TECHNOLOGY; SPATIAL FILTERINGS;

LIGHTNING;

EID: 77958006083     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.020968     Document Type: Article

References (20)

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