Advanced mask aligner lithography: Fabrication of periodic patterns using pinhole array mask and Talbot effect

Optics Express

Volumn 18, Issue 19, 2010, Pages 19485-19495

  Stuerzebecher, Lorenz ^a   Harzendorf, Torsten ^a   Vogler, Uwe ^b   Zeitner, Uwe D ^a   Voelkel, Reinhard ^b  

^a FRAUNHOFER INSTITUTE FOR APPLIED OPTICS AND PRECISION ENGINEERING   (Germany)

^b SUSS MICROOPTICS SA   (Switzerland)

Author keywords

[No Author keywords available]

Indexed keywords

DIFFRACTION PATTERNS; HOLOGRAPHIC INTERFEROMETRY; LITHOGRAPHY; PHOTORESISTS; SPECTRUM ANALYSIS;

ANGULAR SPECTRA; HIGH FLEXIBILITY; HIGH RESOLUTION; ILLUMINATION LIGHT; ILLUMINATION SYSTEM; PERIODIC MICROSTRUCTURE; PERIODIC PATTERN; PINHOLE ARRAYS; SELF IMAGING; SOURCE GEOMETRY; SUBMICRON; TALBOT EFFECTS;

PERIODIC STRUCTURES;

ARTICLE; EQUIPMENT; EQUIPMENT DESIGN; ILLUMINATION; INSTRUMENTATION; PHOTOGRAPHY; REFRACTOMETRY;

EQUIPMENT DESIGN; EQUIPMENT FAILURE ANALYSIS; LIGHTING; PHOTOGRAPHY; REFRACTOMETRY;

EID: 77957015618     PISSN: None     EISSN: 10944087     Source Type: Journal    
DOI: 10.1364/OE.18.019485     Document Type: Article

References (20)

1. H. F. Talbot, "Facts Relating to Optical Science, No. IV," Philos. Mag. 9, 401-407 (1836).
2. A. Kolcodziejczyk, "Lensless multiple image formation by using a sampling filter," Opt. Commun. 59(2), 97-102 (1986).
3. O. Bryngdahl, "Image formation using self-imaging techniques," J. Opt. Soc. Am. 63(4), 416-419 (1973).
4. A. Kolodziejczyk, Z. Jaroszewicz, R. Henao, and O. Quintero, "The Talbot array illuminator: imaging properties and a new interpretation," J. Opt. A, Pure Appl. Opt. 6(6), 651-657 (2004).
5. Z. Jaroszewicz, A. Kolodziejczyk, and M. Sypek, "Microlens array produced with the help of the sampling filter," Opt. Eng. 37(11), 3002-3006 (1998).
6. T. J. Suleski, Y.-C. Chuang, P. C. Deguzman, and R. A. Barton, "Fabrication of optical microstructures through fractional Talbot imaging," Proc. SPIE 5720, 86-93 (2005).
7. R. Voelkel, et al., "Advanced mask aligner lithography: New illumination system," Opt. Express (to be published).
8. R. Voelkel, U. Vogler, A. Bich, K. J. Weible, M. Eisner, M. Hornung, P. Kaiser, R. Zoberbier, E. Cullmann, "Illumination system for a microlithographic contact and proximity exposure apparatus," EP 09169158.4, (2009).
9. T. Harzendorf, L. Stuerzebecher, U. Vogler, U. D. Zeitner, and R. Voelkel, "Half-tone proximity lithography," Proc. SPIE 7716, (2010).
10. J. T. Winthrop, and C. R. Worthington, "Theory of Fresnel Images. I. Plane Periodic Objects in Monochromatic Light," J. Opt. Soc. Am. 55(4), 373-381 (1965).
11. C. Mack, Fundamental principles of optical lithography (John Wiley & Sons, 2007), Chap. 1.
12. W. Wang, and H. Zhu, "Near-field diffraction of a hexagonal array at fractional Talbot planes," Proc. SPIE 7506, (2009).
13. A. W. Lohmann, and J. A. Thomas, "Making an array illuminator based on the talbot effect," Appl. Opt. 29(29), 4337-4340 (1990).
14. V. Arrizón, and J. G. Ibarra, "Trading visibility and opening ratio in Talbot arrays," Opt. Commun. 112(5-6), 271-277 (1994).
15. J. R. Leger, and G. J. Swanson, "Efficient array illuminator using binary-optics phase plates at fractional-Talbot planes," Opt. Lett. 15(5), 288-290 (1990).
16. H. Hamam, "Design of Talbot array illuminators," Opt. Commun. 131(4-6), 359-370 (1996).
17. A. Kolodziejczyk, Z. Jaroszewicz, A. Kowalik, and O. Quintero, "Kinoform sampling filter," Opt. Commun. 200(1-6), 35-42 (2001).
18. E. Bonet, P. Andrés, J. C. Barreio, and A. Pons, "Self-imaging properties of a periodic microlens array: versatile array illuminator realization," Opt. Commun. 106(1-3), 39-44 (1994).
19. B. Besold, and N. Lindlein, "Fractional Talbot effect for periodic microlens arrays," Opt. Eng. 36(4), 1099-1105 (1997). (Pubitemid 127680969)
20. K. Reimer, H. J. Quenzer, M. Jürss, and B. Wagner, "Micro-optic fabrication using one-level gray-tone lithography," Proc. SPIE 3008, 279-288 (1997).