Optimization of illumination pupils and mask structures for proximity printing

Microelectronic Engineering

Volumn 87, Issue 5-8, 2010, Pages 1164-1167

  Motzek, K ^a   Bich, A ^b   Erdmann, A ^a   Hornung, M ^c   Hennemeyer, M ^c   Meliorisz, B ^d   Hofmann, U ^d   Unal N ^d   Voelkel, R ^b   Partel, S ^e   Hudek, P ^e  

^a FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^b SUSS MICROOPTICS SA   (Switzerland)

^c SUSS MicroTec Lithography GmbH   (United States)

^d GenISys GmbH   (Germany)

^e VORARLBERG UNIVERSITY OF APPLIED SCIENCES   (Austria)

Author keywords

Illumination pupil; Mask aligner; MO exposure optics; Optical lithography; Optical proximity correction; Proximity printing

Indexed keywords

ILLUMINATION PUPIL; OPTICAL LITHOGRAPHY; OPTICAL PROXIMITY CORRECTIONS; PROXIMITY PRINTING; PUPIL MASK;

COMPUTER SIMULATION; OPTICAL RESOLVING POWER; OPTIMIZATION; PHOTOLITHOGRAPHY; PRINTING; WINDOWS;

LIGHT;

EID: 76949087283     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2009.10.038     Document Type: Article

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