Investigation of high-resolution contact printing

Microelectronic Engineering

Volumn 85, Issue 5-6, 2008, Pages 744-748

  Meliorisz, B ^a,b   Partel, S ^c   Schnattinger, T ^b   Fuhner T ^b   Erdmann, A ^b   Hudek, P ^c  

^a UNIVERSITY OF ERLANGEN NUREMBERG   (Germany)

^b FRAUNHOFER INSTITUTE FOR INTEGRATED SYSTEMS AND DEVICE TECHNOLOGY IISB   (Germany)

^c VORARLBERG UNIVERSITY OF APPLIED SCIENCES   (Austria)

Author keywords

Contact lithography; Lithography simulation; Submicron patterning

Indexed keywords

COMPUTER SIMULATION; LIGHTING; LITHOGRAPHY; PHOTORESISTS;

CONTACT LITHOGRAPHY; CONVENTIONAL PHOTORESIST;

OPTICAL RESOLVING POWER;

EID: 44149107999     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2007.12.012     Document Type: Article

References (6)

1. Clariant GmbH, D-65203 Wiesbaden, www.clariant.de, distributed by MicroChemicals, www.microchemicals.de.
2. Meliorisz B., and Erdmann A. Journal of Micro/Nanolithography MEMS and MOEMS 6 2 (2007) 023006
3. Meliorisz B., Evanschitzky P., and Erdmann A. Microelectronic Engineering 84 5-8 (2007) 733-736
4. Erdmann A. Modeling and simulation. In: Rizvi S. (Ed). Handbook of Photomask Manufacturing Technology (2005), Taylor & Francis
5. T. Fühner, T. Schnattinger, G. Ardelean, A. Erdmann, Dr.LiTHO: a development and research lithography simulator, in: Proceedings of SPIE, vol. 6520, 2007.
6. Dr. LiTHO webpage: www.drlitho.com.