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Volumn 7716, Issue , 2010, Pages
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Half-tone proximity lithography
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Author keywords
Blazed gratings; Half tone proximity lithography; Mask aligner; Micro optics; RET; Source mask optimization
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Indexed keywords
2 MICRON;
ANGULAR SPECTRA;
BINARY PATTERNS;
BLAZED GRATING;
CONTINUOUS PROFILE;
DIFFRACTION EFFECTS;
HALF-TONE PROXIMITY LITHOGRAPHY;
ILLUMINATION DISTRIBUTION;
ILLUMINATION SYSTEM;
INTENSITY DISTRIBUTION;
LATERAL RESOLUTION;
LIGHT DIFFRACTION;
LITHOGRAPHY MASKS;
MASK FEATURES;
MATHEMATIC MODEL;
MICRO LENS;
MICRO-OPTICAL STRUCTURE;
MICRO-OPTICS FABRICATION;
OPTICS SYSTEMS;
PARAMETER SETTING;
PIXEL SIZE;
PROJECTION LITHOGRAPHY;
RESIST LAYERS;
RET;
SINGLE ELEMENT;
SOURCE MASK OPTIMIZATION;
SUBMICRON;
SUBMICRON RESOLUTION;
SUSS MICROTEC;
TALBOT IMAGING;
CHROMIUM;
DIFFRACTION;
MICROOPTICS;
OPTIMIZATION;
PHOTOLITHOGRAPHY;
PIXELS;
SPECTRUM ANALYSIS;
ANGULAR DISTRIBUTION;
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EID: 77957009650
PISSN: 0277786X
EISSN: None
Source Type: Conference Proceeding
DOI: 10.1117/12.854307 Document Type: Conference Paper |
Times cited : (27)
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References (5)
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