Tunable assembly of nanoparticles on patterned porous film

Langmuir

Volumn 26, Issue 20, 2010, Pages 15982-15988

  Ke, Bei Bei ^a   Wan, Ling Shu ^a   Chen, Peng Cheng ^a   Zhang, Lu Yao ^a   Xu, Zhi Kang ^a  

^a ZHEJIANG UNIVERSITY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AIRFLOW SPEED; AQUEOUS DISPERSIONS; AQUEOUS SOLUTIONS; BLOCKING LAYERS; BREATH-FIGURE METHOD; CASTING CONDITIONS; EXTERNAL SURFACES; FLUORESCEIN SODIUMS; GENERAL APPROACH; HIERARCHICAL STRUCTURES; NANOPARTICLE AGGREGATE; POLY(ACRYLIC ACID ); POLY(N ,N-DIMETHYLAMINOETHYL METHACRYLATE); POLYMER COMPOSITION; POROUS FILM; POROUS SURFACE; POSITIVELY CHARGED; PRE-WETTING; QUATERNIZATION; QUATERNIZED COPOLYMERS; SELECTIVE ASSEMBLY; SELECTIVE MODIFICATION; SILICA NANOPARTICLES;

ADSORPTION; ATOM TRANSFER RADICAL POLYMERIZATION; CARBOXYLIC ACIDS; COPOLYMERIZATION; COPOLYMERS; FREE RADICAL REACTIONS; HYDROGELS; NANOPARTICLES; ORGANIC ACIDS; POLYSTYRENES; SILICA; SOLUTIONS; X RAY PHOTOELECTRON SPECTROSCOPY;

POLYMER FILMS;

METHACRYLIC ACID DERIVATIVE; NANOPARTICLE; NYLON; POLY(2 (DIMETHYLAMINO)ETHYL METHACRYLATE); POLY(2-(DIMETHYLAMINO)ETHYL METHACRYLATE); POLYSTYRENE DERIVATIVE; SILICON DIOXIDE;

ARTICLE; CHEMISTRY; METHODOLOGY; NANOTECHNOLOGY; POROSITY; STATIC ELECTRICITY; WETTABILITY;

METHACRYLATES; NANOPARTICLES; NANOTECHNOLOGY; NYLONS; POLYSTYRENES; POROSITY; SILICON DIOXIDE; STATIC ELECTRICITY; WETTABILITY;

EID: 77957913424     PISSN: 07437463     EISSN: 15205827     Source Type: Journal    
DOI: 10.1021/la1030608     Document Type: Article

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