Nanoscale patterns of dendrimers obtained by soft lithography using elastomeric stamps spontaneously structured by plasma treatment

Langmuir

Volumn 25, Issue 13, 2009, Pages 7752-7758

  Lalo, Hélène ^a,b   Vieu, Christophe ^a,b  

^a LAAS CNRS   (France)

^b INSA   (France)

Author keywords

[No Author keywords available]

Indexed keywords

ADVANCED LITHOGRAPHY; ELASTOMERIC STAMPS; HARD MOLDS; LOW COSTS; NANO SCALE; NANO-SCALE PATTERNS; PLASMA TREATMENT; POLYAMIDOAMINE DENDRIMERS; POLYDIMETHYLSILOXANE STAMPS; SELF-ASSEMBLED; SELF-ASSEMBLED NETWORKS; SOFT LITHOGRAPHY; THIN LAYERS;

DENDRIMERS; MICROCHANNELS; NANOSTRUCTURED MATERIALS; PLASMA APPLICATIONS; PLASMAS; SURFACE ROUGHNESS;

SILICONES;

EID: 67650088892     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la804121d     Document Type: Article

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