Illumination artifacts in hyper-NA vector imaging

Journal of the Optical Society of America A: Optics and Image Science, and Vision

Volumn 27, Issue 10, 2010, Pages 2272-2284

  Zhang, Jun ^a   Kim, Yongsik ^a   Yang, Seung Hune ^b   Milster, Tom D ^a  

^a UNIVERSITY OF ARIZONA   (United States)

^b SAMSUNG Electronics   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

PHOTOMASKS; SILICON WAFERS;

HYPER-NA; ILLUMINATION CONDITIONS; IMAGE PROFILE; METAL GRATING; MICROSCOPIC SYSTEM; MODEL-BASED; OFF-AXIS; PATTERNED SILICON; POLARIZATION STATE; RIGOROUS COUPLED-WAVE THEORY; SIMULATION RESULT; SOLID IMMERSION LENS; VECTOR EFFECTS; VECTOR IMAGING;

SEMICONDUCTING SILICON COMPOUNDS;

EID: 77957868504     PISSN: 10847529     EISSN: 15208532     Source Type: Journal    
DOI: 10.1364/JOSAA.27.002272     Document Type: Article

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