SCOPUS 정보 검색 플랫폼

Applied Physics Letters

Volumn 93, Issue 23, 2008, Pages

Effects of artificially structured micrometer holes on the transport behavior of Al-doped ZnO layers

(4) Elm, M T a Henning, T a Klar, P J a Szyszka, B b

a JUSTUS LIEBIG UNIVERSITY (Germany)

b FRAUNHOFER INSTITUTE FOR SURFACE ENGINEERING AND THIN FILMS IST (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRIC RESISTANCE; MAGNETIC FIELD EFFECTS; MAGNETOELECTRONICS; MAGNETORESISTANCE; MAGNETRON SPUTTERING; SEMICONDUCTING ZINC COMPOUNDS; THICKNESS MEASUREMENT; TRANSPORT PROPERTIES; ZINC OXIDE;

GLASS SUBSTRATES; HOLE DIAMETERS; HOLE SIZES; NEGATIVE MAGNETORESISTANCES; RF MAGNETRON SPUTTERING; TRANSPORT BEHAVIORS; ZNO LAYERS; ZNO:AL THIN FILMS;

ALUMINUM;

EID: 57649120769 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3040312 Document Type: Article

Times cited : (18)

References (15)

1
- 33847179491
- 0021-8979 10.1063/1.2437572.
- B. -Z. Dong, G. -J. Fang, J. -F. Wang, W. -J. Guan, and X. -Z. Zhao, J. Appl. Phys. 0021-8979 10.1063/1.2437572 101, 033713 (2007).
- (2007) J. Appl. Phys. , vol.101 , pp. 033713
- Dong, B.-Z.¹ Fang, G.-J.² Wang, J.-F.³ Guan, W.-J.⁴ Zhao, X.-Z.⁵

2
- 0035477928
- 0021-8979 10.1063/1.1398070.
- Z. L. Pei, C. Sun, M. H. Tan, J. Q. Xiao, D. H. Guan, R. F. Huang, and L. S. Wen, J. Appl. Phys. 0021-8979 10.1063/1.1398070 90, 3432 (2001).
- (2001) J. Appl. Phys. , vol.90 , pp. 3432
- Pei, Z.L.¹ Sun, C.² Tan, M.H.³ Xiao, J.Q.⁴ Guan, D.H.⁵ Huang, R.F.⁶ Wen, L.S.⁷

3
- 2942754282
- 0022-0248 10.1016/j.jcrysgro.2004.05.007.
- G. Yuan, Z. Ye, L. Zhu, J. Huang, Q. Qian, and B. Zhao, J. Cryst. Growth 0022-0248 10.1016/j.jcrysgro.2004.05.007 268, 169 (2004).
- (2004) J. Cryst. Growth , vol.268 , pp. 169
- Yuan, G.¹ Ye, Z.² Zhu, L.³ Huang, J.⁴ Qian, Q.⁵ Zhao, B.⁶

4
- 34547349078
- 1367-2630 10.1088/1367-2630/9/7/214.
- K. Cheng, G. Cheng, S. Wang, L. Li, S. Dai, X. Zhang, B. Zou and Z. Du, New J. Phys. 1367-2630 10.1088/1367-2630/9/7/214 9, 214 (2007).
- (2007) New J. Phys. , vol.9 , pp. 214
- Cheng, K.¹ Cheng, G.² Wang, S.³ Li, L.⁴ Dai, S.⁵ Zhang, X.⁶ Zou, B.⁷ Du, Z.⁸

5
- 2442514528
- 0021-4922 10.1143/JJAP.43.976.
- H. -K. Kim, T. -Y. Seong, K. -K. Kim, S. -J. Park, Y. S. Yoon, and I. Adesida, Jpn. J. Appl. Phys., Part 1 0021-4922 10.1143/JJAP.43.976 43, 976 (2004).
- (2004) Jpn. J. Appl. Phys., Part 1 , vol.43 , pp. 976
- Kim, H.-K.¹ Seong, T.-Y.² Kim, K.-K.³ Park, S.-J.⁴ Yoon, Y.S.⁵ Adesida, I.⁶

6
- 0030145375
- 0947-8396 10.1007/BF01567122.
- D. H. Zhang and H. L. Ma, Appl. Phys. A: Mater. Sci. Process. 0947-8396 10.1007/BF01567122 62, 487 (1996).
- (1996) Appl. Phys. A: Mater. Sci. Process. , vol.62 , pp. 487
- Zhang, D.H.¹ Ma, H.L.²

7
- 0025692531
- T. Minami, K. Oohashi, S. Takata, T. Mouri, and N. Ogawa, Thin Solid Films 193, 721 (1990).
- (1990) Thin Solid Films , vol.193 , pp. 721
- Minami, T.¹ Oohashi, K.² Takata, S.³ Mouri, T.⁴ Ogawa, N.⁵

8
- 0026242562
- 0040-6090 10.1016/0040-6090(91)90472-A.
- S. Ghosh, A. Sarkar, S. Chaudhuri, and A. K. Pal, Thin Solid Films 0040-6090 10.1016/0040-6090(91)90472-A 205, 64 (1991).
- (1991) Thin Solid Films , vol.205 , pp. 64
- Ghosh, S.¹ Sarkar, A.² Chaudhuri, S.³ Pal, A.K.⁴

9
- 0034294171
- 0022-3727 10.1088/0022-3727/33/20/304.
- M. Chen, Z. L. Pei, X. Wang, Y. H. Yu, X. H. Liu, C. Sun, and L. S. Wen, J. Phys. D: Appl. Phys. 0022-3727 10.1088/0022-3727/33/20/304 33, 2538 (2000).
- (2000) J. Phys. D: Appl. Phys. , vol.33 , pp. 2538
- Chen, M.¹ Pei, Z.L.² Wang, X.³ Yu, Y.H.⁴ Liu, X.H.⁵ Sun, C.⁶ Wen, L.S.⁷

10
- 24944440795
- 0003-6951 10.1063/1.2045553.
- F. Reuss, S. Frank, C. Kirchner, R. Kling, Th. Gruber, and A. Waag, Appl. Phys. Lett. 0003-6951 10.1063/1.2045553 87, 112104 (2005).
- (2005) Appl. Phys. Lett. , vol.87 , pp. 112104
- Reuss, F.¹ Frank, S.² Kirchner, C.³ Kling, R.⁴ Gruber, Th.⁵ Waag, A.⁶

11
- 29844440751
- T. Andrearczyk, J. Jaroszyński, G. Grabecki, T. Dietl, T. Fukumura and M. Kawasaki, Phys. Rev. B 72, 121309 (2005).
- (2005) Phys. Rev. B , vol.72 , pp. 121309
- Andrearczyk, T.¹ Jaroszyński, J.² Grabecki, G.³ Dietl, T.⁴ Fukumura, T.⁵ Kawasaki, M.⁶

12
- 0030270739
- 0038-1098
- F. G. Pikus and G. E. Pikus, Solid State Commun. 100, 95 (1996). 0038-1098
- (1996) Solid State Commun. , vol.100 , pp. 95
- Pikus, F.G.¹ Pikus, G.E.²

13
- 0003460093
- (North Holland, Amsterdam).
- B. L. Altshuler and A. G. Aronov, Electron-Electron Interaction in Disordered Systems (North Holland, Amsterdam, 1985).
- (1985) Electron-Electron Interaction in Disordered Systems
- Altshuler, B.L.¹ Aronov, A.G.²

14
- 15344350485
- 0163-1829 10.1103/PhysRevB.28.2914.
- G. Bergmann, Phys. Rev. B 0163-1829 10.1103/PhysRevB.28.2914 28, 2914 (1983).
- (1983) Phys. Rev. B , vol.28 , pp. 2914
- Bergmann, G.¹

15
- 0009316524
- R. P. Khosla and J. R. Fisher, Phys. Rev. B 2, 4084 (1970).
- (1970) Phys. Rev. B , vol.2 , pp. 4084
- Khosla, R.P.¹ Fisher, J.R.²

* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.