Effect of deposition distance and temperature on electrical, optical and structural properties of radio-frequency magnetron-sputtered gallium-doped zinc oxide

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 190-196

  Gorrie, Christopher W ^a   Sigdel, Ajaya K ^b   Berry, Joseph J ^c   Reese, Brandon J ^d   Van Hest, Maikel F A M ^c   Holloway, Paul H ^a   Ginley, David S ^c   Perkins, John D ^c  

^a J Crayton Pruitt Family Department of Biomedical Engineering   (United States)

^b UNIVERSITY OF DENVER   (United States)

^c NATIONAL RENEWABLE ENERGY LABORATORY   (United States)

^d University of Colorado at Boulder   (United States)

Author keywords

Electronic properties; Gallium doped zinc oxide; Optical properties; Radio frequency magnetron sputtering; Structural properties

Indexed keywords

CERAMIC TARGET; DEPOSITION TEMPERATURES; ELECTRICAL , OPTICAL AND STRUCTURAL PROPERTIES; GLASS SUBSTRATES; GRAIN SIZE; OPTICAL TRANSMITTANCE; RADIO FREQUENCIES; RADIO-FREQUENCY MAGNETRON SPUTTERING; ROOT MEAN SQUARE; SUBSTRATE TEMPERATURE; TARGET-SUBSTRATE DISTANCE; VISIBLE RANGE; ZNO;

CARRIER CONCENTRATION; ELECTRIC PROPERTIES; ELECTRONIC PROPERTIES; GALLIUM; GALLIUM ALLOYS; GRAIN SIZE AND SHAPE; MAGNETRON SPUTTERING; OPTICAL PROPERTIES; OXIDE FILMS; STRUCTURAL PROPERTIES; SUBSTRATES; SURFACE ROUGHNESS; ZINC; ZINC OXIDE;

OPTICAL FILMS;

EID: 77957715655     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.098     Document Type: Article

References (21)

1. V. Verma, D. Kim, H. Jeon, M. Jeon, and W. Choi Thin Solid Films 516 23 2008 8736
2. S.-H.K. Park, C.-S. Hwang, H.Y. Jeong, H.Y. Chu, and K.I. Cho Electrochem. Solid. St. 11 1 2008 H10 11/1
3. Y.-S. Park, H.-K. Park, S.-W. Cho, J.-A. Jeong, K.-H. Choi, H.-K. Kim, J.-Y. Lee, J.-H. Lee, H.-D. Bae, Y.-H. Tak, and W.-J. Choc Electrochem. Solid. St. 11 11 2008 J85 11/11
4. K. Nakahara, H. Yuji, K. Tamura, S. Akasaka, H. Tampo, S. Niki, A. Tsukazaki, A. Ohtomo, and M. Kawasaki T. Ferechteh Hosseini, W.L. Cole, SPIE 2006 61220
5. B. Sang, K. Kushiya, D. Okumura, and O. Yamase Sol. Energy Mater. Sol. Cells 67 1-4 2001 237 67/1-4
6. F.J. Pern, R. Noufi, B. To, C. DeHart, X. Li, and S.H. Glick G.D. Neelkanth, SPIE 2008 70480P
7. V. Assuncao, E. Fortunato, A. Marques, A. Goncalves, I. Ferreira, and H. Aguas R. Martins. Thin Solid Films 442 1-2 2003 102
8. W. Lin, R. Ma, J. Xue, and B. Kang Sol. Energy Mater. Sol. Cells 91 20 2007 1902
9. O. Nakagawara, Y. Kishimoto, H. Seto, Y. Koshido, Y. Yoshino, and T. Makino Appl. Phys. Lett. 89 9 2006 091904
10. Q. Ma, Z. Ye, H. He, J. Wang, L. Zhu, and B. Zhao Mater. Charact. 59 2 2008 124
11. M. Selmi, F. Chaabouni, M. Abaab, and B. Rezig Superlattice Microst. 44 3 2008 268
12. J.S. Wellings, A.P. Samantilleke, P. Warren, S.N. Heavens, and I.M. Dharmadasa Semicond. Sci. Tech. 23 12 2008 125003
13. M.-S. Oh, D.-K. Hwang, D.-J. Seong, H.-S. Hwang, S.-J. Park, and E. Do Kim J. Electrochem. Soc. 155 9 2008 D599
14. V. Khranovskyy, U. Grossner, O. Nilsen, V. Lazorenko, G.V. Lashkarev, B.G. Svensson, and R. Yakimova Thin Solid Films 515 2 2006 472
15. M.D.L.L. Olvera, H. Gomez, and A. Maldonado Sol. Energy Mater. Sol. Cells 91 15-16 2007 1449
16. E. Fortunato, A. Goncalves, A. Marques, A. Viana, H. Aguas, L. Pereira, I. Ferreira, P. Vilarinho, and R. Martins Surf. Coat. Tech. 180 2004 20
17. V. Bhosle, and J. Narayan J. Appl. Phys. 100 9 2006 093519
18. X. Yu, J. Ma, F. Ji, Y. Wang, X. Zhang, and H. Ma Thin Solid Films 483 1-2 2005 296
19. J.H. Kim, B. Du Ahn, C.H. Kim, K.A. Jeon, H.S. Kang, and S.Y. Lee Thin Solid Films 516 7 2008 1330
20. Q.-B. Ma, Z.-Z. Ye, H.-P. He, S.-H. Hu, J.-R. Wang, L.-P. Zhu, Y.-Z. Zhang, and B.-H. Zhao J. Cryst. Growth 304 1 2007 64
21. T. Minami, T. Miyata, T. Yamamoto, and H. Toda J. Vac. Sci. Technol. A 18 4 2000 1584