Atomic layer deposition of SiO2 from Tris(dimethylamino)silane and ozone by using temperature-controlled water vapor treatment

Thin Solid Films

Volumn 519, Issue 1, 2010, Pages 270-275

  Hirose, F ^a   Kinoshita, Y ^a   Shibuya, S ^a   Narita, Y ^a   Takahashi, Y ^a   Miya, H ^b   Hirahara, K ^c   Kimura, Y ^d   Niwano, M ^d  

^a YAMAGATA UNIVERSITY   (Japan)

^b HITACHI KOKUSAI ELECTRIC INC   (Japan)

^c SHIN ETSU CHEMICAL CO LTD   (Japan)

^d TOHOKU UNIVERSITY   (Japan)

Author keywords

Adsorption; Atomic layer deposition; Infrared absorption spectroscopy; Ozone; Silicon dioxide; Water vapor

Indexed keywords

ATOMIC LAYER; MULTIPLE INTERNAL REFLECTION GEOMETRIES; OZONE OXIDATION; ROOM TEMPERATURE; SI SURFACES; SI(100) SURFACE; SILICON DIOXIDE; SUBSTRATE TEMPERATURE;

ATOMIC LAYER DEPOSITION; ATOMIC SPECTROSCOPY; ATOMS; DEWATERING; GAS ADSORPTION; INFRARED ABSORPTION; OXIDATION; OZONE; OZONE LAYER; OZONIZATION; SILICA; SILICON; SILICON OXIDES; VAPOR DEPOSITION; WATER ABSORPTION; WATER TREATMENT; WATER VAPOR;

ABSORPTION SPECTROSCOPY;

EID: 77957697519     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.07.107     Document Type: Article

References (16)

1. T. Morimoto, T. Ohguro, S. Momose, T. Iinuma, I. Kunishima, K. Suguro, I. Katakabe, H. Nakajima, M. Tsuchiaki, M. Ono, Y. Katsumata, and H. Iwai IEEE Trans. Electron. Dev. ED-42 1995 915
2. J.D. Ferguson, E.R. Smith, A.W. Weimer, and S.M. George J. Electrochem. Soc. 151 2004 G528
3. H. Muta Jpn. J. Appl. Phys. 17 1978 1089
4. Y. Kinoshita, F. Hirose, H. Miya, K. Hirahara, Y. Kimura, and M. Niwano Electrochem. Solid-State Lett. 10 2007 G80
5. W. Kern, and D.A. Puotinen RCA Rev. 31 1970 187
6. G.S. Higashi, Y.J. Chabal, G.W. Trucks, and K. Ragharachari Appl. Phys. Lett. 56 1990 656
7. F. Hirose, M. Kurita, Y. Kimura, and M. Niwano Appl. Surf. Sci. 253 2006 1912
8. M. Shinohara, Y. Kimura, M. Saito, and M. Niwano Surf. Sci. 502 2002 96
9. M. Niwano, M. Shinohara, Y. Neo, and K. Yokoo Appl. Surf. Sci. 162-163 2000 111
10. S.M. Han, and E.S. Aydil J. Vac. Sci. Technol. A 14 1996 2062
11. M.L. Hair J. Non-Cryst. Solids 19 1975 299
12. M. Niwano, M. Terashi, M. Shinohara, D. Shoji, and N. Miyamoto Surf. Sci. 401 1998 364
13. M. Niwano, J. Kageyama, K. Kinashi, N. Miyamoto, and K. Honma J. Vac. Sci. Technol. A 12 1994 465
14. Y.J. Chabal Phys. Rev. B: Condens. Matter Mater. Phys. 29 1984 3677
15. S. Kamiyama, T. Miura, and Y. Nara Thin Solid Films 515 2005 1517
16. A. Delabie, G. Pourtois, M. Caymax, S.D. Gendt, L.A. Ragnarsson, M. Heyns, Y. Fedorenko, J. Swerts, and J.W. Maes J. Vac. Sci. Technol. A 25 2007 1302