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Applied Physics Letters

Volumn 97, Issue 13, 2010, Pages

Straining of SiGe ultrathin films with mesoporous Si substrates

(7) Boucherif, A a Blanchard, N P a Marty, O b Regreny, P a Guillot, G a Grenet, G a Lysenko, V a

a UNIVERSITÉ DE LYON (France)

b UNIVERSITÉ LYON 1 (France)

Author keywords

[No Author keywords available]

Indexed keywords

SILICON; SUBSTRATES; TEMPERATURE; TENSILE STRAIN; ULTRATHIN FILMS;

COMPRESSIVE STRAIN; CRYSTALLINE QUALITY; FABRICATION AND CHARACTERIZATIONS; LOW-TEMPERATURE OXIDATION; MONOCRYSTALLINE; POROUS SUBSTRATES; SI SUBSTRATES; STRAINED SIGE;

SI-GE ALLOYS;

EID: 77957690443 PISSN: 00036951 EISSN: None Source Type: Journal
DOI: 10.1063/1.3494594 Document Type: Article

Times cited : (4)

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