-
2
-
-
0000748226
-
-
APPLAB 0003-6951,. 10.1063/1.126464
-
S. Q. Liu, N. J. Wu, and A. Ignatiev, Appl. Phys. Lett. APPLAB 0003-6951 76, 2749 (2000). 10.1063/1.126464
-
(2000)
Appl. Phys. Lett.
, vol.76
, pp. 2749
-
-
Liu, S.Q.1
Wu, N.J.2
Ignatiev, A.3
-
3
-
-
33748501587
-
-
TDIMD5 0163-1918
-
I. G. Baek, M. S. Lee, S. Seo, M. J. Lee, D. H. Seo, D. -S. Suh, J. C. Park, S. O. Park, H. S. Kim, I. K. Yoo, U. I. Chung, and J. T. Moon, Tech. Dig.-Int. Electron Devices Meet. TDIMD5 0163-1918 2005, 750.
-
Tech. Dig. - Int. Electron Devices Meet.
, vol.2005
, pp. 750
-
-
Baek, I.G.1
Lee, M.S.2
Seo, S.3
Lee, M.J.4
Seo, D.H.5
Suh, D.-S.6
Park, J.C.7
Park, S.O.8
Kim, H.S.9
Yoo, I.K.10
Chung, U.I.11
Moon, J.T.12
-
4
-
-
43549126477
-
Resistive switching in transition metal oxides
-
DOI 10.1016/S1369-7021(08)70119-6, PII S1369702108701196
-
A. Sawa, Mater. Today MTOUAN 1369-7021 11, 28 (2008). 10.1016/S1369-7021(08)70119-6 (Pubitemid 351680723)
-
(2008)
Materials Today
, vol.11
, Issue.6
, pp. 28-36
-
-
Sawa, A.1
-
5
-
-
67650102619
-
-
ADVMEW 0935-9648,. 10.1002/adma.200900375
-
R. Waser, R. Dittmann, G. Staikov, and K. Szot, Adv. Mater. ADVMEW 0935-9648 21, 2632 (2009). 10.1002/adma.200900375
-
(2009)
Adv. Mater.
, vol.21
, pp. 2632
-
-
Waser, R.1
Dittmann, R.2
Staikov, G.3
Szot, K.4
-
6
-
-
84860077655
-
3 thin film at room temperature
-
DOI 10.1103/PhysRevB.70.224403, 224403
-
A. Odagawa, H. Sato, I. H. Inoue, H. Akoh, M. Kawasaki, Y. Tokura, T. Kanno, and H. Adachi, Phys. Rev. B PLRBAQ 0556-2805 70, 224403 (2004). 10.1103/PhysRevB.70.224403 (Pubitemid 40256163)
-
(2004)
Physical Review B - Condensed Matter and Materials Physics
, vol.70
, Issue.22
, pp. 2244031-2244034
-
-
Odagawa, A.1
Sato, H.2
Inoue, I.H.3
Akoh, H.4
Kawasaki, M.5
Tokura, Y.6
Kanno, T.7
Adachi, H.8
-
7
-
-
10044237971
-
-
APPLAB 0003-6951,. 10.1063/1.1812580
-
A. Sawa, T. Fujii, M. Kawasaki, and Y. Tokura, Appl. Phys. Lett. APPLAB 0003-6951 85, 4073 (2004). 10.1063/1.1812580
-
(2004)
Appl. Phys. Lett.
, vol.85
, pp. 4073
-
-
Sawa, A.1
Fujii, T.2
Kawasaki, M.3
Tokura, Y.4
-
8
-
-
67649494447
-
-
APPLAB 0003-6951,. 10.1063/1.3159471
-
Z. L. Liao, Z. Z. Wang, Y. Meng, Z. Y. Liu, P. Gao, J. L. Gang, H. W. Zhao, X. J. Liang, X. D. Bai, and D. M. Chen, Appl. Phys. Lett. APPLAB 0003-6951 94, 253503 (2009). 10.1063/1.3159471
-
(2009)
Appl. Phys. Lett.
, vol.94
, pp. 253503
-
-
Liao, Z.L.1
Wang, Z.Z.2
Meng, Y.3
Liu, Z.Y.4
Gao, P.5
Gang, J.L.6
Zhao, H.W.7
Liang, X.J.8
Bai, X.D.9
Chen, D.M.10
-
9
-
-
34547306629
-
3/metal structures
-
DOI 10.1002/adma.200601957
-
K. Tsubouchi, I. Ohkubo, H. Kumigashira, M. Oshima, Y. Matsumoto, K. Itaka, T. Ohnishi, M. Lippmaa, and H. Koinuma, Adv. Mater. ADVMEW 0935-9648 19, 1711 (2007). 10.1002/adma.200601957 (Pubitemid 47153955)
-
(2007)
Advanced Materials
, vol.19
, Issue.13
, pp. 1711-1713
-
-
Tsubouchi, K.1
Ohkubo, I.2
Kumigashira, H.3
Oshima, M.4
Matsumoto, Y.5
Itaka, K.6
Ohnishi, T.7
Lippmaa, M.8
Koinuma, H.9
-
10
-
-
33751079841
-
3/Cu structure
-
DOI 10.1063/1.2361087
-
W. C. Peng, J. G. Lin, and J. H. Wu, J. Appl. Phys. JAPIAU 0021-8979 100, 093704 (2006). 10.1063/1.2361087 (Pubitemid 44772579)
-
(2006)
Journal of Applied Physics
, vol.100
, Issue.9
, pp. 093704
-
-
Peng, W.C.1
Lin, J.G.2
Wu, J.H.3
-
11
-
-
77954693097
-
-
PLRBAQ 0556-2805,. 10.1103/PhysRevB.80.235113
-
S. Asanuma, H. Akoh, H. Yamada, and A. Sawa, Phys. Rev. B PLRBAQ 0556-2805 80, 235113 (2009). 10.1103/PhysRevB.80.235113
-
(2009)
Phys. Rev. B
, vol.80
, pp. 235113
-
-
Asanuma, S.1
Akoh, H.2
Yamada, H.3
Sawa, A.4
-
12
-
-
38349083229
-
-
PRLTAO 0031-9007,. 10.1103/PhysRevLett.100.026402
-
H. Wadati, A. Maniwa, A. Chikamatsu, I. Ohkubo, H. Kumigashira, M. Oshima, A. Fujimori, M. Lippmaa, M. Kawasaki, and H. Koinuma, Phys. Rev. Lett. PRLTAO 0031-9007 100, 026402 (2008). 10.1103/PhysRevLett.100.026402
-
(2008)
Phys. Rev. Lett.
, vol.100
, pp. 026402
-
-
Wadati, H.1
Maniwa, A.2
Chikamatsu, A.3
Ohkubo, I.4
Kumigashira, H.5
Oshima, M.6
Fujimori, A.7
Lippmaa, M.8
Kawasaki, M.9
Koinuma, H.10
-
13
-
-
0025519047
-
-
SIANDQ 0142-2421,. 10.1002/sia.740151108
-
I. Olefjord, H. J. Mathieu, and P. Marcus, Surf. Interface Anal. SIANDQ 0142-2421 15, 681 (1990). 10.1002/sia.740151108
-
(1990)
Surf. Interface Anal.
, vol.15
, pp. 681
-
-
Olefjord, I.1
Mathieu, H.J.2
Marcus, P.3
-
15
-
-
77149123619
-
-
JPEDAV 1547-7037,. 10.1007/s11669-009-9591-1
-
V. Raghavan, J. Phase Equilib. Diffus. JPEDAV 1547-7037 30, 626 (2009). 10.1007/s11669-009-9591-1
-
(2009)
J. Phase Equilib. Diffus.
, vol.30
, pp. 626
-
-
Raghavan, V.1
-
16
-
-
79955995534
-
-
APPLAB 0003-6951,. 10.1063/1.1497439
-
A. Plecenik, K. Fröhlich, J. P. Espinos, J. P. Holgado, A. Halabica, M. Pripko, and A. Gilabert, Appl. Phys. Lett. APPLAB 0003-6951 81, 859 (2002). 10.1063/1.1497439
-
(2002)
Appl. Phys. Lett.
, vol.81
, pp. 859
-
-
Plecenik, A.1
Fröhlich, K.2
Espinos, J.P.3
Holgado, J.P.4
Halabica, A.5
Pripko, M.6
Gilabert, A.7
-
17
-
-
0242500321
-
-
PLRBAQ 0556-2805,. 10.1103/PhysRevB.67.092404
-
C. Mitra, Z. Hu, P. Raychaudhuri, S. Wirth, S. I. Csiszar, H. H. Hsieh, H. -J. Lin, C. T. Chen, and L. H. Tjeng, Phys. Rev. B PLRBAQ 0556-2805 67, 092404 (2003). 10.1103/PhysRevB.67.092404
-
(2003)
Phys. Rev. B
, vol.67
, pp. 092404
-
-
Mitra, C.1
Hu, Z.2
Raychaudhuri, P.3
Wirth, S.4
Csiszar, S.I.5
Hsieh, H.H.6
Lin, H.-J.7
Chen, C.T.8
Tjeng, L.H.9
|