Wafer admission control for clustered photolithography tools

ASMC (Advanced Semiconductor Manufacturing Conference) Proceedings

Volumn , Issue , 2010, Pages 220-225

  Park, Kyungsu ^a   Morrison, James R ^a  

^a Korea Advanced Institute of Science and Technology (KAIST)   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ADMISSION CONTROL; ADMISSION CONTROL ALGORITHMS; BUFFER OCCUPANCY; MAXIMUM THROUGH-PUT; PROCESS TIME; SEMI-CONDUCTOR WAFER; STATE-OF-THE-ART METHODS; TIME WINDOWS; TRANSIENT OPERATION; WAFER-HANDLING ROBOTS;

ALGORITHMS; MANUFACTURE; PHOTOLITHOGRAPHY; SCANNING; SEMICONDUCTOR DEVICE MANUFACTURE; THROUGHPUT;

SILICON WAFERS;

EID: 77957567079     PISSN: 10788743     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/ASMC.2010.5551457     Document Type: Conference Paper

References (11)

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