Deposition of crystalline copper films from tetranuclear copper (II) complexes without application of reducing atmosphere

Applied Organometallic Chemistry

Volumn 24, Issue 10, 2010, Pages 714-720

  Shahid, Muhammad ^a   Mazhar, Muhammad ^b   Hamid, Mazhar ^a   O'Brien, Paul ^c   Malik, Mohammad A ^c   Helliwell, Madeleine ^c  

^a UNIVERSITY OF MALAYA   (Malaysia)

^b QUAID I AZAM UNIVERSITY   (Pakistan)

^c UNIVERSITY OF MANCHESTER   (United Kingdom)

Author keywords

AACVD; Copper films; Homometallic copper complexes; X ray structure; XRD

Indexed keywords

AACVD; COPPER FILMS; HOMOMETALLIC COPPER COMPLEXES; X-RAY STRUCTURE; XRD;

CHEMICAL VAPOR DEPOSITION; COPPER COMPOUNDS; CRYSTALLINE MATERIALS; METALLIC FILMS; MORPHOLOGY;

COPPER;

EID: 77957316202     PISSN: 02682605     EISSN: 10990739     Source Type: Journal    
DOI: 10.1002/aoc.1672     Document Type: Article

References (46)

1. P. L. Pei, C. H. Ting, C. Chiang, C. S. Wei, D. B. Fraeer, Mater. Res. SOC. Symp. Proc. VLSI V 1990, 359.
2. a) W. L Gladfelter, Chem. Mater. 1993, 5, 1372;
3. b) C. Steinbruchel, Appl. Surf. Sci. 1995, 91, 139;
4. c) P. Doppelt, Microelectron. Eng. 1997, 37/38, 89;
5. d) V. N. Vertoprakhov, S. A. Krupoder, Russ. Chem. Rev. 2000, 69, 1057.
6. Y. Chi, P.-F. Hsu, C.-S. Liu, W.-L. Ching, T.-Y. Chou, A.J. Carty, S.-M. Peng, G.-H. Lee, S.-H. Chuang, J. Mater. Chem. 2002, 12, 3541.
7. V. L. Young, D. F. COX, M. E. Davis, Chem. Mater. 1993, 5, 1701.
8. a) S.C. Goel, K.S. Kramer, M.Y. Chiang, W.E. Buhro, Polyhedron 1990, 9, 611;
9. b) M. Shahid, A.A. Tahir, M. Zeller, M. Hamid, K. C. Molloy, M. Mazhar, A. D. Hunter, Eur. J. Inorg. Chem. 2009, 1043.
10. N. Awaya, K. Ohno, Y. Arita, J. Electrochem. Soc. 1995, 142, 3173;
11. b)Y. D. Chen, A. Reisman, I. Turlik, D. Temple, J. Electrochem. Soc. 1995, 142, 3903.
12. a) D. N. Armitage, N.I. Dunhill, R.H. West, J. O. Williams, J. Cryst. Growth 1991, 108, 683;
13. b) G. M. Nuesca, J.A. Kelber, Thin Solid Films 1995, 262, 224;
14. c) N. S. Borgharkar, G. L. Griffin, J. Electrochem. Soc. 1998, 145, 347;
15. d) M. Utrialnen, M. Kroger Laukkanen, L.-S. Johansson, L Niinisto, Appl. Surf. Sci. 2000, 157, 151.
16. S. M. Fine, P. N. Dyer, J. A. T. Norman, B. A. Muratore, R. L. Iampietro, Mater. Res. Soc. Symp. Roc. 1990, 204, 415.
17. a) H. K. Shin, K. M. Chi, M. J. Hempden-Smith, T. T. Kodas, J. D. Farr, M. Paffett, Adv. Mater. 1991, 3, 246;
18. b) D. B. Beach, F. K. LeGoues, C. K. Hu, Chem. Mater. 1990, 2, 216.
19. E. Lay, Y.-H. Song, Y.-C. Chlu, Y.-M. Lin, Y. Chi, lnorg. Chem. 2005, 44, 7226.
20. G.S. Girolami, P.M. Jeffries, L.H. Dubois, J. Am. Chem. Soc. 1993, 115, 1015;
21. b) M.J. Hampden-Smith, T. Kodas, Polyhedron 1995, 14, 699;
22. c) A. Jain, T.T. Kodas, T.S. Corbitt, M.J. Hampden Smith, Chem. Mater. 1996, 8, 1119;
23. ) M. L. H. ter Heerdt, P. J. Van der Put, J. Schoonman, Chem. Map. Deposition 2001, 7, 199;
24. e) M. B. Naik, W. N. Gill, R. H. Wentorf, R. R. Reeves, Thin Solid Films 1995, 262, 60;
25. f) C. Cavallotti, V. Gupta, C. Sieber, K. F. Jensen, Phys. Chem. Chem. Phys. 2003, 5, 2818.
26. J. A.T. Norman, J. Phys. IV C2, 1991, 263, 1.
27. M. Joulaud, C. Angekort, P. Doppelt, T. Mourier, D. Mayer, Microelectron. Eng. 2002, 64, 107;
28. b) T.-Y. Chen, J. Vaissermann, E. Ruiz, J. P. Senateur, P. Doppelt, Chem. Mater. 2001, 13, 3993.
29. E. Lay, Y.-H. Song, Y.-C. Chiu, Y.-M. Lin, Y. Chi, Inorg. Chem. 2005, 44, 7226.
30. R. Anwander, F. C. Munck, T. Priermeler, W. Scherer, O. Runte, W. A. Herrmann, Inorg. Chem. 1997, 36, 3545.
31. M. Hamid, A.A. Tahir, M. Mazhar, M. Zeller, K.C. Molloy, A.D. Hunter, Inorg. Chem. 2006, 45, 10457.
32. A.A. Tahir, M. Mazhar, M. Hamid, M. Zeller, A. D. Hunter New J. Chem. 2009, 33, 1535.
33. G. M. Sheldrick, Acta Cryst. A 2008, 64, 112.
34. a) Bruker Advanced X-ray Solutions SMART for WNT/2000 (version 5.628), Bruker AXS Inc., Madison, WI, 1997-2002;
35. b) Bruker Advanced X-ray Solutions SHELXTL (version 6.10), Bruker AXS Inc., Madison, WI, 2000.
36. M. Shahid, M. Mazhar, P. O'Brien, M. A. Malik, J. Raftery, Polyhedron 2009, 28, 807.
37. Y. Chi, P.-F. Hsu, C.-S. Liu, W.-L. Ching, T.-Y. Chou, A.J. Carty, S.-M. Peng, G.-H. Lee, S.-H. Chuang, J. Mater. Chem. 2002, 12, 3541.
38. a) M. Hamid, A.A. Tahir, M. Mazhar, F. Ahmad, K. C. Molloy, G. Kociok-Kohn, Inorg. Chim. Acta 2008, 361, 188;
39. b) M. Hamid, A.A. Tahir, M. Mazhar, M. Zeller, K. C. Molloy, A. D. Hunter, Inorg. Chem. 2006, 45, 10457.
40. a) K. Nakamoto, Infrared and Raman Spectra of Inorganic and Coordination Compounds, John Wiley and Sons: New York, 1986;
41. b) G. B. Deacon, R. J. Phillips, Coord. Chem. Rev. 1980, 33, 227.
42. J. D. Lee, Concise Inorganic Chemistry, Chapman & Hall: London, 1996.
43. S. Wang, S.J. Trepanier, J.-C. Zheng, Z. Pang, M.Z. Wagner, Inorg. Chem. 1992, 37, 2118.
44. P. Werndrup, S. Gohil, V.G. Kessler, M. Kritikos, L.G. HubertPfalzgraf, Polyhedron 2001, 20, 2163.
45. I.-K. Suh, H. Ohta, Y. Waseda, J. Mater. Sci. 1988, 23, 757.
46. J. Hu, R. G. Gordon, J. Appl. Phys. 1992, 71, 880.