Dissolution behavior of photoresists: An in-situ analysis

Journal of Photopolymer Science and Technology

Volumn 23, Issue 5, 2010, Pages 639-642

  Itani, Toshiro ^a   Santillan, Julius Joseph ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

Atomic force microscopy; Developer solution; Dissolution characterization; EUV; Photoresists

Indexed keywords

EID: 77957233183     PISSN: 09149244     EISSN: 13496336     Source Type: Journal    
DOI: 10.2494/photopolymer.23.639     Document Type: Article

References (10)

1. H. Oizumi, K. Kaneyama, J. J. S. Santillan, K. Matsumaro, K. Matsunaga, T. Itani: Proc. SPIE 7639-26 (2010) in press.
2. C. Koh, L. Ren, J. Georger, F. Goodwin, S. Wurm, B. Pierson, J. Park, T. Wallow, T. Younkin, and P. Naulleau: Proc. SPIE 7271 (2009) 727124.
3. K. Matsunaga, H. Oizumi, K. Kaneyama, G. Shiraishi, K. Matsumaro, J. J. Santillan, T. Itani: Proc. SPIE 7636-27 (2010) in press.
4. E. Putna, T. Younkin, M. Chandhok, and K. Frasure: Proc. SPIE 7273 (2009) 72731L.
5. R. Allen, P. Brock, Y.-H. Na, M. Sherwood, H. Truong, G. Wallraff, M. Fujiwara and K. Maeda: J. Photopolym. Sci. Technol. 22 (2009) 25.
6. International Technology Roadmap for Semiconductors 2009 Edition, Lithography.
7. M. Toriumi, J. Santillan, T. Itani, T. Kozawa and S. Tagawa: J. Vac. Sci. Technol. B 25 (2007) 2486.
8. A. Kokkinis, E. S. Valamontes, and I. Raptis: Journal of Physics CS10 (2005) 401.
9. T. Ando, T. Uchihashi, N. Kodera, D. Yamamoto, A. Miyagi, M. Taniguchi and H. Yamashita: Pflugers Arch. 456 (2008) 211.
10. T. Itani and J.J. Santillan: J. Vac. Sci. Technol. B 27 (2009) 2986.