Alternative developer solutions for extreme ultraviolet resist

Journal of Vacuum Science and Technology B: Microelectronics and Nanometer Structures

Volumn 27, Issue 6, 2009, Pages 2986-2989

  Itani, Toshiro ^a   Santillan, Julius Joseph ^a  

^a SEMICONDUCTOR LEADING EDGE TECHNOLOGIES INC   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

EUV RESISTS; EXTREME ULTRAVIOLET; EXTREME ULTRAVIOLETS; FIELD EXPOSURE; ILLUMINATION CONDITIONS; IMAGING PERFORMANCE; LINE-AND-SPACE; LINEWIDTH ROUGHNESS; MINIMAL EFFECTS; POLYHYDROXYSTYRENES; RESIST RESOLUTION; RESOLUTION CAPABILITY; SEMICONDUCTOR INDUSTRY; TETRABUTYLAMMONIUM HYDROXIDES; TETRAMETHYL AMMONIUM HYDROXIDE; TETRAPROPYLAMMONIUM HYDROXIDE;

SEMICONDUCTOR DEVICE MANUFACTURE; ULTRAVIOLET DEVICES;

DISSOLUTION;

EID: 72849134679     PISSN: 10711023     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3258151     Document Type: Conference Paper

References (16)

1. I. Mori et al., Proc. SPIE 6921, 692102 (2008).
2. B. LaFontaine et al., Proc. SPIE 6921, 69210P (2008).
3. D. Kawamura, K. Kaneyama, S. Kobayashi, J. Santillan, and T. Itani, Proc. SPIE 6323, 692313 (2008).
4. S. Kobayashi, J. J. Santillan, and T. Itani, Proc. SPIE 6923, 692345 (2008).
5. K. Dean et al., Proc. SPIE 6519, 65191P (2007).
6. T. Hirayama, D. Shiono, H. Hada, J. Onodera, and M. Ueda, J. Photopolym. Sci. Technol. 17, 434 (2004).
7. A. Yamaguchi, H. Fukuda, T. Arai, J. Yamamoto, T. Hirayama, D. Shiono, H. Hata, and J. Onodera, J. Vac. Sci. Technol. B 23, 2711 (2005).
8. T. H. Fedynyshyn, D. K. Astolfi, A. Cabral, and J. Roberts, Proc. SPIE 6519, 65190X1 (2007).
9. M. Wang, C. T. Lee, C. Henderson, W. Yueh, J. M. Roberts, and K. Gonsalves, Proc. SPIE 6923, 692312 (2008).
10. H. Oizumi, T. Kumise, and T. Itani, J. Photopolym. Sci. Technol. 21, 443 (2008).
11. D. He and F. Cerrina, J. Vac. Sci. Technol. B 16, 3748 (1998).
12. E. Hassanein et al., Proc. SPIE 6921, 692111 (2008).
13. M. Shirai, A. Kurosima, H. Okamura, K. Kaneyama, and T. Itani, Proc. SPIE 6923, 692344 (2008).
14. Lithography, International Technology Roadmap for Semiconductors (ITRS) 2007 edition.
15. T. Itani, K. Kaneyama, T. Kozawa, and S. Tagawa, J. Vac. Sci. Technol. B 26, 2261 (2008).
16. V. Prabhu et al., Proc. SPIE 5376, 443 (2008).