Dissolution properties of ultrathin photoresist films with multiwavelength interferometry

Journal of Physics: Conference Series

Volumn 10, Issue 1, 2005, Pages 401-404

  Kokkinis, A ^a   Valamontes, E S ^b   Raptis, I ^a  

^a INSTITUTE OF MICROELECTRONICS   (Greece)

^b UNIVERSITY OF WEST ATTICA   (Greece)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 22544439047     PISSN: 17426588     EISSN: 17426596     Source Type: Conference Proceeding    
DOI: 10.1088/1742-6596/10/1/098     Document Type: Article

References (9)

1. ITRS 2003 Edition http://public.itrs.net/Files/2003ITRS/Home2003.htm
2. Pike C, Bell S, Lyons C, Plat M, Levinson H and Okoroanyanwu U 2000 J. Vac. Sci. Technol. B 18 3360
3. Raptis I, Velesiotis D, Vasilopoulou M and Argitis P 2000 Microelectron. Eng. 53 489
4. Konnerth K L and Dill F 1975 IEEE Trans. Electron. Dev. ED22 452
5. Niakoula D, Raptis I, Goustouridis D and Argitis P 2004 Japan. J. Appl. Phys. 43 5247
6. Burns S, Schmid G, Trinque B, Willson Wunderlich J, Tsiartas P, Taylor C, Burns R and Willson C G 2003 Proc. SPIE 5039 ed T H Fedynyshyn (SPIE Press) 1063-1075
7. Heavens O S 1991 Optical Properties of Thin Solid Films (Dover Publications Inc., New York)
8. Robertson S A, Kang D, Scheer S A and Brodsky C J 2002 Metrology Inspection and Process Control for Microlithography, Proc. SPIE 4689 ed D J C Herr (SPIE Press) 213-222
9. Olzierski A and Raptis I 2004 Microelectron. Eng. 73-74 244