Nanoscale electrical and crystallographic properties of ultra-thin dielectric films

Thin Solid Films

Volumn 518, Issue 21 SUPPL., 2010, Pages

  Liang, Yuan Chang ^a   Liang, Yung Ching ^b  

^a NATIONAL TAIWAN OCEAN UNIVERSITY   (Taiwan)

^b UNIVERSITY OF SOUTHERN CALIFORNIA   (United States)

Author keywords

Characterization; Nanoscale electrical properties; Surface morphology; X ray scattering

Indexed keywords

ANNEALING TEMPERATURES; ATOMIC FORCE MICROSCOPE IMAGES; CHEMICAL HOMOGENEITY; CRYSTALLOGRAPHIC PROPERTIES; DEPTH PROFILE; HOMOGENEOUS FILMS; INTERFACE ROUGHNESS; NANO SCALE; NANOSTRUCTURAL; OXYGEN ATMOSPHERE; RADIO-FREQUENCY-MAGNETRON SPUTTERING; ROOM TEMPERATURE; SRTIO; STO FILMS; ULTRA-THIN DIELECTRIC FILMS; X-RAY PHOTOELECTRON SPECTROSCOPE;

ANNEALING; CRYSTALLINE MATERIALS; DIELECTRIC FILMS; ELECTRIC PROPERTIES; MORPHOLOGY; NANOSTRUCTURED MATERIALS; OXYGEN; SCATTERING; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS; X RAY SCATTERING; X RAYS;

SURFACE MORPHOLOGY;

EID: 77957047529     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2010.03.021     Document Type: Conference Paper

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