Influence of forming Gas annealing on BaPbO3/Pb(Zr, Ti)O 3/BaPbO3 ferroelectric capacitors

Electrochemical and Solid-State Letters

Volumn 8, Issue 9, 2005, Pages

  Liang, Chun Sheng ^a   Wu, Lin Jung ^a   Wu, Jenn Ming ^a  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING; BARIUM COMPOUNDS; DEGRADATION; DISSOCIATION; FERROELECTRIC MATERIALS; HETEROJUNCTIONS; HYDROGEN; LEAD COMPOUNDS; MAGNETRON SPUTTERING; THIN FILMS;

DIFFUSION BARRIER; FERROELECTRIC CAPACITORS; GAS ANNEALING; HYDROGEN-INDUCED DEGRADATION;

CAPACITORS;

EID: 25144437011     PISSN: 10990062     EISSN: None     Source Type: Journal    
DOI: 10.1149/1.1979328     Document Type: Article

References (17)

1. H. M. Duiker, P. D. Beale, J. F. Scott, C. A. Paz de Araujo, B. M. Melnick, J. D. Cuchiaro, and L. D. McMillan, J. Appl. Phys., 68, 5783 (1990).
2. C. Verdier, F. D. Morrison, D. C. Lupascu, and J. F. Scott, J. Appl. Phys., 97, 24107 (2005).
3. S. Aggarwal, S. R. Perusse, C. W. Tipton, R. Ramesh, H. D. Drew, T. Venkatesan, D. B. Romero, V. B. Podobedov, and A. Weber, Appl. Phys. Lett., 73, 1973 (1998).
4. J. K. Lee, Y. Park, and I. Chung, J. Appl. Phys., 92, 2724 (2002).
5. J. P. Han and T. P. Ma, Appl. Phys. Lett., 71, 1267 (1997).
6. Y. Shimamoto, K. Kushida-Abdelghafar, H. Miki, and Y. Fujisaki, Appl. Phys. Lett., 70, 3096 (1997).
7. I. Stolichnov, A. Tagantsev, and N. Setter, Appl. Phys. Lett., 75, 1790 (1999).
8. H. N. Al-Shareef, K. R. Bellur, and A. I. Kingon, Appl. Phys. Lett., 66, 239 (1995).
9. Y. Masuda and T. Nozaka., Jpn. J. Appl. Phys., Part 1, 43, 6576 (2004).
10. S. Y. Cha and H. C. Lee, Jpn. J. Appl. Phys., Part 1, 38, L1128 (1999).
11. K. K. Abdelghafar, M. Hiratani, and Y. Fujisaki, J. Appl. Phys., 85, 1069 (1999).
12. M. Hiratani, Y. Matsui, K. Imagawa, and S. Kimura, Jpn. J. Appl. Phys., Part 1, 38, L1275 (1999).
13. Y. B. Kim, J. H. Park, D. H. Hong, D. K. Choi, C. Y. Yoo, and H. Horii, J. Appl. Phys., 93, 9212 (2003).
14. C. S. Liang, J. M. Wu, and M. C. Chang, Appl. Phys. Lett., 81, 3624 (2002).
15. Y. R. Lou and J. M. Wu, Appl. Phys. Lett., 79, 3669 (2001).
16. J. S. Speck, A. Seifert, W. Pompe, and R. Ramesh, J. Appl. Phys., 76, 477 (1994).
17. V. Bornand, S. Trolier-McKinstry, K. Takemura, and C. A. Randall, J. Appl. Phys., 87, 3965 (2000).