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Volumn 43, Issue 30, 2010, Pages
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Effect of laser beam energy density on the structural and electrical properties of TiO2-doped Bi5Nb3O15 thin film grown by pulsed laser deposition
a a a a a a b c |
Author keywords
[No Author keywords available]
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Indexed keywords
BEAM ENERGIES;
CANDIDATE MATERIALS;
DIELECTRIC CONSTANTS;
ELECTRICAL PROPERTY;
EMBEDDED CAPACITOR;
ENERGY DENSITY;
FREE ELECTRON;
HIGH BREAKDOWN FIELDS;
LASER BEAM ENERGY;
LOW BEAM;
LOW-LEAKAGE CURRENT;
POROUS MICROSTRUCTURE;
PREFERRED ORIENTATIONS;
SHARP INTERFACE;
STRUCTURAL AND ELECTRICAL PROPERTIES;
TI DOPING;
TIO;
DEPOSITION;
DOPING (ADDITIVES);
LASER BEAMS;
PHASE INTERFACES;
PULSED LASER DEPOSITION;
PULSED LASERS;
ELECTRIC PROPERTIES;
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EID: 77956903128
PISSN: 00223727
EISSN: 13616463
Source Type: Journal
DOI: 10.1088/0022-3727/43/30/305404 Document Type: Article |
Times cited : (3)
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References (14)
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