Mist-CVD growth of high quality ZnO thin films at low temperature for inverted organic solar cells

Journal of Nanoelectronics and Optoelectronics

Volumn 5, Issue 2, 2010, Pages 247-251

  Kim, Kwon Ho ^a   Shin, Kyung Sik ^a   Kumar, Brijesh ^a   Kim, Kyung Kook ^b   Kim, Sang Woo ^a,c  

^a Sungkyunkwan University   (South Korea)

^b Korea Polytechnic University   (South Korea)

^c Sungkyunkwan University   (South Korea)

Author keywords

Inverted Organic Solar Cell; Mist CVD; Power Conversion Efficiency; ZnO Thin Film

Indexed keywords

COATED GLASS SUBSTRATES; CRYSTALLINE QUALITY; CRYSTALLINITIES; FIELD EMISSION SCANNING ELECTRON MICROSCOPES; GLASS SUBSTRATES; HIGH QUALITY; LOW TEMPERATURES; MIST-CVD; ORGANIC SOLAR CELL; PHOTOVOLTAIC POWER; POWER CONVERSION EFFICIENCIES; TEMPERATURE RANGE; TRANSMISSION SPECTRUMS; ZNO FILMS; ZNO THIN FILM;

CHEMICAL VAPOR DEPOSITION; CONVERSION EFFICIENCY; DEPOSITION; FIELD EMISSION; LIGHT TRANSMISSION; METALLIC FILMS; MORPHOLOGY; OPTICAL FILMS; OPTICAL PROPERTIES; OXIDE FILMS; SCANNING ELECTRON MICROSCOPY; SOLAR CELLS; SUBSTRATES; SURFACE MORPHOLOGY; THIN FILMS; TIN; TIN OXIDES; TITANIUM COMPOUNDS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC OXIDE;

ITO GLASS;

EID: 77955954246     PISSN: 1555130X     EISSN: None     Source Type: Journal    
DOI: 10.1166/jno.2010.1103     Document Type: Article

References (18)

1. J. L. Zhao, X. M. Li, J. M. Bian, W.-D. Yu, and X. D. Gao, J. Cryst. Growth 276, 507 (2005).
2. M. C. Jeong, B. Y. Oh, W. Lee, and j. M. Myoung, J. Cryst. Growth 268, 149 (2004).
3. H. J. Ko, Y. Chen, S. K. Hong, and T. Yao, J. Cryst. Growth 209, 816 (2000).
4. E. Ohshima, H. Ogino, I. Niikura, K. Maeda, M. Sato, M. Ito, and T. Fukuda, J. Cryst. Growth 260, 166 (2004).
5. Y. Natsume and H. Sakata, Thin Solid Films 372, 30 (2000).
6. D. Gal, G. Hodes, D. Lincot, and H. W. Schock, Thin Solid Films 361, 79 (2000).
7. B. N. Pawar, S. R. Jadkar, and M. G. Takwale, J. Phys. Chem. Solids 66, 1779 (2005).
8. L. Dong, J. Jiao, D. W. Tuggle, J. M. Petty, S. A. Elliff, and M. Coulter, Appl. Phys. Lett. 82, 1096 (2003).
9. A. Shah, J. Meier, A. Bucechel, U. Kroll, J. Steinhauser, F. Meillaud, H. Schade, and D. Domine, Thin Solid Films 502, 292 (2006).
10. J. G. Lu, T. Kawaharamura, H. Nishinaka, Y. Kamada, T. Ohshima, and S. Fujita, J. Cryst. Growth 299, 1 (2007).
11. J. L. van Heerden and R. Swanepoel, Thin Solid Films 299, 72 (1997).
12. K. K. Kim, S. Lee, H. Kim, J. Park, S. Lee, Y. Park, S. Park, and S. W. Kim, Appl. Phys. Lett. 94, 071118 (2009).
13. T. Fujii, Y. Gao, R. Sharma, E. L. Hu, S. P. DenBaars, and S. Nakamura, Appl. Phys. Lett. 84, 855 (2004).
14. M. Nisha, S. Anusha, A. Antony, R. Manol, and M. K. Jayaraj, Appl. Surf. Sci. 252, 1430 (2005).
15. V. S. Reddy, K. Das, A. Dhar, and S. K. Ray, Semicond. Sci. Technol. 21, 1747 (2006).
16. D. Song, A. G. Aberle, and J. Xia, Appl. Surf. Sci. 195, 291 (2002).
17. J. Lee, D. Lee, D. Lim, and K. Yang, Thin Solid Films 515, 6094 (2007).
18. S. Fay, U. Kroll, and C. Bucher, Sol. Energy Mater. Sol. Cells 86, 385 (2005).