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Volumn 16, Issue 8-9, 2010, Pages 1465-1470

Immunoassay using poly-tetrafluoroethylene microstructure in organic solvent

Author keywords

[No Author keywords available]

Indexed keywords

ANALYTE CONCENTRATION; ANALYTES; DETECTION RANGE; ENZYME LINKED IMMUNOSORBENT ASSAY; EVAPORATION PROCESS; HIGH ASPECT RATIO MICROSTRUCTURES; LAB-ON-A-CHIP; MOUSE IGG; TETRAFLUOROETHYLENE;

EID: 77955852725     PISSN: 09467076     EISSN: None     Source Type: Journal    
DOI: 10.1007/s00542-010-1063-3     Document Type: Conference Paper
Times cited : (3)

References (7)
  • 2
    • 49949111796 scopus 로고    scopus 로고
    • Fabrication of a PTFE-filled waveguide for millimeter-wave components using SR direct etching
    • Kishihara M, Ukita Y, Utsumi Y, Ohta I (2008) Fabrication of a PTFE-filled waveguide for millimeter-wave components using SR direct etching. Microsyst Technol 14:1417-1422
    • (2008) Microsyst Technol , vol.14 , pp. 1417-1422
    • Kishihara, M.1    Ukita, Y.2    Utsumi, Y.3    Ohta, I.4
  • 3
    • 49949089269 scopus 로고    scopus 로고
    • Polytetrafluoroethylene processing characteristics using high-energy X-ray
    • Ukita Y, Kanda K, Matsui S, Kishihara M, Utsumi Y (2008a) Polytetrafluoroethylene processing characteristics using high-energy X-ray. Microsyst Technol 14:1573-1579
    • (2008) Microsyst Technol , vol.14 , pp. 1573-1579
    • Ukita, Y.1    Kanda, K.2    Matsui, S.3    Kishihara, M.4    Utsumi, Y.5
  • 5
    • 29044435693 scopus 로고    scopus 로고
    • Large area and wide dimension range X-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation
    • Utsumi Y, Kishimoto T (2005) Large area and wide dimension range X-ray lithography for lithographite, galvanoformung, and abformung process using energy variable synchrotron radiation. J Vac Sci Technol B 23:2903
    • (2005) J Vac Sci Technol B , vol.23 , pp. 2903
    • Utsumi, Y.1    Kishimoto, T.2
  • 7
    • 0000236148 scopus 로고
    • High aspect ratio micomachining Teflon by direct exposure to synchrotron radiation
    • Zhang Y, Katoh T, Washio M, Yamada H, Hamada S (1995) High aspect ratio micomachining Teflon by direct exposure to synchrotron radiation. Appl Phys Lett 67:872-874
    • (1995) Appl Phys Lett , vol.67 , pp. 872-874
    • Zhang, Y.1    Katoh, T.2    Washio, M.3    Yamada, H.4    Hamada, S.5


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.