Amplified nanopatterning by self-organized shadow mask ion lithography

Applied Physics Letters

Volumn 97, Issue 5, 2010, Pages

  Chiappe, D ^a   Toma, A ^a   Zhang, Z ^a,b   Boragno, C ^a   Buatier De Mongeot, F ^a,c  

^a UNIVERSITY OF GENOA   (Italy)

^b ISTITUTO ITALIANO DI TECNOLOGIA   (Italy)

^c INSTITUTE OF PHYSICS   (China)

Author keywords

[No Author keywords available]

Indexed keywords

AMPLIFICATION RATE; DIELECTRIC SUBSTRATES; HIGH ASPECT RATIO; ION IRRADIATION; ION-BEAM SPUTTERING; METAL FILM; NANOPATTERNING; ORDERED NANOWIRES; SELF-ORGANIZED; SELF-ORGANIZED FORMATION; SHADOW MASK; SMALL-SCALE FEATURES; SPUTTERING YIELDS; TWO-MATERIALS;

ASPECT RATIO; DIELECTRIC MATERIALS; IONS; METALLIC FILMS; NANOWIRES; SPUTTERING;

AMPLIFICATION;

EID: 77955763844     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3473770     Document Type: Article

References (21)

1. E. Hutter and J. H. Fendler, Adv. Mater. ADVMEW 0935-9648 16, 1685 (2004). 10.1002/adma.200400271
2. F. Buatier de Mongeot, A. Toma, A. Molle, S. Lizzit, L. Petaccia, and A. Baraldi, Phys. Rev. Lett. PRLTAO 0031-9007 97, 056103 (2006). 10.1103/PhysRevLett.97.056103 (Pubitemid 44181741)
3. S. Zhang, Nat. Biotechnol. NABIF9 1087-0156 21, 1171 (2003). 10.1038/nbt874 (Pubitemid 37186173)
4. A. Toma, D. Chiappe, D. Massab, C. Boragno, and F. Buatier de Mongeot, Appl. Phys. Lett. APPLAB 0003-6951 93, 163104 (2008). 10.1063/1.3002319
5. U. Valbusa, C. Boragno, and F. Buatier de Mongeot, J. Phys.: Condens. Matter JCOMEL 0953-8984 14, 8153 (2002). 10.1088/0953-8984/14/35/301
6. W. L. Chan and E. Chason, J. Appl. Phys. JAPIAU 0021-8979 101, 121301 (2007). 10.1063/1.2749198 (Pubitemid 47141263)
7. A. Keller, S. Facsko, and W. Möller, Nucl. Instrum. Methods Phys. Res. B NIMBEU 0168-583X 267, 656 (2009). 10.1016/j.nimb.2008.11.044
8. A. Toma, F. Buatier de Mongeot, R. Buzio, G. Firpo, S. R. Bhattacharyya, C. Boragno, and U. Valbusa, Nucl. Instrum. Methods Phys. Res. B NIMBEU 0168-583X 230, 551 (2005). 10.1016/j.nimb.2004.12.099 (Pubitemid 40330016)
9. B. Davidovitch, M. J. Aziz, and M. P. Brenner, Phys. Rev. B PLRBAQ 0556-2805 76, 205420 (2007). 10.1103/PhysRevB.76.205420
10. M. Moseler, P. Gumbsch, C. Casiraghi, A. C. Ferrari, and J. Robertson, Science SCIEAS 0036-8075 309, 1545 (2005). 10.1126/science.1114577 (Pubitemid 41266477)
11. A. Toma, D. Chiappe, B. Šetina Batič, M. Godec, M. Jenko, and F. Buatier de Mongeot, Phys. Rev. B PLRBAQ 0556-2805 78, 153406 (2008). 10.1103/PhysRevB.78.153406
12. A. Toma, B. Šetina Batič, D. Chiappe, C. Boragno, U. Valbusa, M. Godec, M. Jenko, and F. Buatier de Mongeot, J. Appl. Phys. JAPIAU 0021-8979 104, 104313 (2008). 10.1063/1.3021100
13. P. Karmakar and D. Ghose, Surf. Sci. SUSCAS 0039-6028 554, L101 (2004). 10.1016/j.susc.2004.02.020
14. M. Stepanova and S. K. Dew, J. Vac. Sci. Technol. B JVTBD9 1071-1023 24, 592 (2006). 10.1116/1.2172249
15. K. Zhang, F. Rotter, M. Uhrmacher, C. Ronning, J. Krauser, and H. Hofsäss, New J. Phys. NJOPFM 1367-2630 9, 29 (2007). 10.1088/1367-2630/9/2/ 029 (Pubitemid 46290547)
16. I. Horcas, R. Fernandez, J. M. Gomez-Rodriguez, J. Colchero, J. Gomez-Herrero, and A. M. Baro, Rev. Sci. Instrum. RSINAK 0034-6748 78, 013705 (2007). 10.1063/1.2432410 (Pubitemid 46511822)
17. A. Toma, D. Chiappe, C. Boragno, and F. Buatier de Mongeot, Phys. Rev. B PLRBAQ 0556-2805 81, 165436 (2010). 10.1103/PhysRevB.81.165436
18. Yiping Zhao, Gwo-Ching Wang, and Toh-Ming Lu, Characterization of Amorphous and Crystalline Rough Surface: Principles and Applications (Academic, New York, 2001).
19. W. M. Tong and R. S. Williams, Annu. Rev. Phys. Chem. ARPLAP 0066-426X 45, 401 (1994). 10.1146/annurev.pc.45.100194.002153
20. E. A. Eklund, R. Bruinsma, J. Rudnick, and R. S. Williams, Phys. Rev. Lett. PRLTAO 0031-9007 67, 1759 (1991). 10.1103/PhysRevLett.67.1759
21. C. C. Umbach, R. L. Headrick, and K. -C. Chang, Phys. Rev. Lett. PRLTAO 0031-9007 87, 246104 (2001). 10.1103/PhysRevLett.87.246104