Influence of RF power on the properties of sputtered ZnO:Al thin films

Physica Status Solidi (A) Applications and Materials Science

Volumn 207, Issue 7, 2010, Pages 1577-1580

  Antony, Aldrin ^a   Carreras, Paz ^a   Keitzl, Thomas ^a   Roldá n, Rubén ^a   Nos, Oriol ^a   Frigeri, Paolo ^a   Asensi, José Miguel ^a   Bertomeu, Joan ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Doping; Electrical properties; Optical properties; Sputtering; Structure; Transparent conducting oxide; ZnO

Indexed keywords

DOPING; ELECTRICAL PROPERTY; STRUCTURE; TRANSPARENT CONDUCTING OXIDE; ZNO;

CONDUCTIVE FILMS; CRYSTALLITE SIZE; DOPING (ADDITIVES); ELECTRIC PROPERTIES; MAGNETRON SPUTTERING; OXIDE FILMS; THIN FILMS; X RAY DIFFRACTION; X RAY DIFFRACTION ANALYSIS; ZINC; ZINC OXIDE;

OPTICAL PROPERTIES;

EID: 77955639994     PISSN: 18626300     EISSN: 18626319     Source Type: Journal    
DOI: 10.1002/pssa.200983765     Document Type: Article

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