Amorphous silicon thin film solar cells deposited entirely by hot-wire chemical vapour deposition at low temperature (< 150 °C)

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3575-3577

  Villar, Fernando ^a   Antony, Aldrin ^a   Escarré, Jordi ^a   Ibarz, Daniel ^a   Roldán, Rubén ^a   Stella, Marco ^a   Muñoz, Delfina ^a   Asensi, José Miguel ^a   Bertomeu, Joan ^a  

^a UNIVERSITY OF BARCELONA   (Spain)

Author keywords

Amorphous materials; Hot wire deposition; Solar cells

Indexed keywords

A-SI:H; AMORPHOUS SILICON THIN FILMS; BACK REFLECTORS; CELL FABRICATIONS; CHEMICAL VAPOUR DEPOSITIONS; DOPED LAYERS; HOT-WIRE DEPOSITION; INITIAL EFFICIENCIES; LOW PROCESS TEMPERATURES; LOW TEMPERATURES; P LAYERS; RF- MAGNETRON SPUTTERING;

CELLS; CHEMICAL VAPOR DEPOSITION; ELECTRODEPOSITION; FABRICATION; MAGNETRON SPUTTERING; PHOTOVOLTAIC CELLS; REFLECTION; SEMICONDUCTING SILICON COMPOUNDS; SOLAR CELLS; WIRE;

AMORPHOUS SILICON;

EID: 64349087475     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.074     Document Type: Article

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