Study of atomic resolved plasmon-loss image by spherical aberration-corrected STEM-EELS method

Ultramicroscopy

Volumn 110, Issue 9, 2010, Pages 1161-1165

  Yamazaki, Takashi ^a   Kotaka, Yasutoshi ^a   Tsukada, Mineharu ^a   Kataoka, Yuji ^a  

^a FUJITSU LABORATORIES LTD   (Japan)

Author keywords

Cs corrector; Plasmon loss image; STEM EELS; Valence excitation

Indexed keywords

ATOMIC RESOLUTION; BRIGHTFIELD; DYNAMICAL SIMULATION; FIRST PRINCIPLE CALCULATIONS; HIGH-ANGLE ANNULAR DARK FIELDS; PLASMON LOSS; SPHERICAL ABERRATIONS; STEM IMAGES; STEM-EELS; VALENCE EXCITATIONS;

ATOMIC SPECTROSCOPY; ENERGY DISSIPATION; PLASMONS; TRANSMISSION ELECTRON MICROSCOPY;

ELECTRON ENERGY LOSS SPECTROSCOPY;

ARTICLE; BRIGHTNESS; CALCULATION; COMPUTER SIMULATION; CONTROLLED STUDY; DARKNESS; ELECTRON ENERGY LOSS SPECTROSCOPY; EXCITATION; IMAGE PROCESSING; IMAGE QUALITY; LIGHT ABSORPTION; LIGHT RELATED PHENOMENA; PHYSICAL PARAMETERS; PLASMON LOSS IMAGE; SCANNING TRANSMISSION ELECTRON MICROSCOPY; SPHERIC ABERRATION;

EID: 77955511272     PISSN: 03043991     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.ultramic.2010.04.011     Document Type: Article

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