Electrical breakdown at low pressure for planar microelectromechanical systems with 10- to 500-μm gaps

Journal of Micro/Nanolithography, MEMS, and MOEMS

Volumn 8, Issue 3, 2009, Pages

  Carazzetti, Patrick ^a   Shea, Herbert R ^a  

^a EPFL   (Switzerland)

Author keywords

Aluminum; Argon; Breakdown voltage; Helium; Mean free path; Microelectromechanical systems; Nitrogen; Paschen curve; Planar interdigitated electrodes

Indexed keywords

AEROSPACE APPLICATIONS; ALUMINUM; ARGON; ATMOSPHERIC PRESSURE; CURVE FITTING; ELECTRIC BREAKDOWN; ELECTRODES; ENGINEERING RESEARCH; GEOMETRY; HELIUM; MECHATRONICS; MEMS; MICROELECTROMECHANICAL DEVICES; PRESSURE EFFECTS;

ALUMINUM ELECTRODES; CHIP-SCALE; ELECTRICAL BREAKDOWN; EXPERIMENTAL STUDIES; GAS PRESSURES; GAS TYPE; INTER-DIGITATED ELECTRODES; LENGTH SCALE; LOW PRESSURES; LOW-PRESSURE OPERATIONS; MEAN FREE PATH; MEMS ELECTRODE; NITROGEN ATMOSPHERES; OFF-CHIP; ON CHIPS; PASCHEN CURVE; PASCHEN CURVES; PLANAR GEOMETRIES; PLASMA GENERATION; RELIABLE OPERATION; WORK FOCUS;

COMPOSITE MICROMECHANICS;

EID: 77955412927     PISSN: 19325150     EISSN: 19325134     Source Type: Journal    
DOI: 10.1117/1.3152368     Document Type: Conference Paper

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