Micro-structured electrode arrays: Glow discharges in Ar and N2 at atmospheric pressure using a variable radio frequency generator

Vacuum

Volumn 80, Issue 11-12, 2006, Pages 1144-1148

  Schrader, Christian ^a   Baars Hibbe, Lutz ^a   Gericke, Karl Heinz ^a   Marinus van Veldhuizen, Eduard ^b   Lucas, Nina ^a   Sichler, Philipp ^a   Büttgenbach, Stephanus ^a  

^a TECHNICAL UNIVERSITY OF BRAUNSCHWEIG   (Germany)

^b EINDHOVEN UNIVERSITY OF TECHNOLOGY   (Netherlands)

Author keywords

Atmospheric pressure; Glow discharge; Micro structured electrode arrays; Paschen curves; Radiofrequency

Indexed keywords

ATMOSPHERIC PRESSURE; ELECTRIC DISCHARGES; FREQUENCIES; PLASMA JETS;

CAPACITIVE ELECTRODE SYSTEM; DIELECTRIC BARRIER ARRAYS; NON-THERMAL PLASMA SYSTEM; PASCHEN CURVES; RADIOFREQUENCY;

MICROELECTRODES;

EID: 33748808709     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2006.01.059     Document Type: Article

References (21)

1. Massines F., Rabehi A., Decomps P., Ben Gadri R., Ségur P., and Mayoux C. J Appl Phys 83 (1998) 2950-2957
2. Okazaki S., Kogoma M., Uehara M., and Kimura Y. J Phys D: Appl Phys 26 (1993) 889-892
3. Trunec D., Brablec A., and Buchte J. J Phys D: Appl Phys 34 (2001) 1697-1699
4. Kelly Wintenberg K., Hodge A., Montie T.C., Deleanu L., Shermann D., Reece Roth J., et al. J Vac Sci Technol 17 (1999) 1539-1544
5. Park J., Henins I., Hermann H.W., and Selwyn G.S. J Appl Phys 89 (2001) 15-19
6. Stark R.H., and Schoenbach K.H. J Appl Phys 85 (1999) 2075-2080
7. Penache C., Bräuning-Demian A., Spielberger L., and Schmidt-Böcking H. In: Proceedings of the seventh international symposium on high pressure low temperature plasma chemistry (HAKONE VII) (2000) p. 501-5
8. Eden J.G., Park S.-J., Ostrom N.P., McCain S.T., Wagner C.J., Vojak B.A., et al. J Phys D: Appl Phys 36 (2003) 2869-2877
9. Geßner C., Scheffler P., and Gericke K.-H. In: Proceedings of the seventh international symposium on high pressure low temperature plasma chemistry (HAKONE VII) (2000) p. 112-6
10. Geßner C., Scheffler P., and Gericke K.-H. In: Proceedings of the international conference on phenomena in ionized gases (XXV ICPIG) vol. 4 (2001) p. 151-2
11. Schlemm H., and Roth D. Surf Coat Technol 142-144 (2001) 272-276
12. Gericke K.-H., Geßner C., and Scheffler P. Vacuum 65 (2002) 291-297
13. Baars-Hibbe L., Sichler P., Schrader C., Geßner C., Gericke K.-H., and Büttgenbach S. Surf Coat Technol 174-175 (2003) 519-523
14. Harz C., Bevan J.W., Jackson M.W., and Wofford B.A. Environ Sci Technol 32 (1998) 682-687
15. Reece Roth J. Industrial plasma engineering (1995), IOP Publishing, Bristol, Philadelphia p. 418-9
16. Wiesemann K. Einführung in die Gaselektronik (1976), B.G. Teubner, Stuttgart p. 267-8
17. Raizer Yu.P. Gas discharge physics vol. 56 (1997), Springer, Berlin, Heidelberg p. 133-5
18. Grill A. Cold Plasma in materials fabrication (1994), IEEE Press, New York p. 24-34
19. Baars-Hibbe L., Sichler P., Schrader C., Lucas N., Gericke K.-H., and Büttgenbach S. J Phys D: Appl Phys 38 (2005) 510-517
20. Brown S.C. Basic data of plasma physics (1966), M.I.T. Press, Cambridge p. 219-35
21. Baars-Hibbe L., Sichler P., Schrader C., Gericke K.-H., and Büttgenbach S. Plasma Process Polym 2 (2005) 174-182