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Volumn 142-144, Issue , 2001, Pages 272-276
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Atmospheric pressure plasma processing with microstructure electrodes and microplanar reactors
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Author keywords
Atmospheric pressure; Microplaner reactors; Microstructured electrodes; Plasma processing
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Indexed keywords
ATMOSPHERIC PRESSURE;
DEPOSITION;
ELECTRODES;
INERT GASES;
MICROSTRUCTURE;
PLASMA APPLICATIONS;
THIN FILMS;
CARBON FILMS;
PLASMAS;
PLASMA TREATMENT;
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EID: 0035387581
PISSN: 02578972
EISSN: None
Source Type: Journal
DOI: 10.1016/S0257-8972(01)01153-7 Document Type: Article |
Times cited : (25)
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References (10)
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