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Volumn 142-144, Issue , 2001, Pages 272-276

Atmospheric pressure plasma processing with microstructure electrodes and microplanar reactors

Author keywords

Atmospheric pressure; Microplaner reactors; Microstructured electrodes; Plasma processing

Indexed keywords

ATMOSPHERIC PRESSURE; DEPOSITION; ELECTRODES; INERT GASES; MICROSTRUCTURE; PLASMA APPLICATIONS; THIN FILMS;

EID: 0035387581     PISSN: 02578972     EISSN: None     Source Type: Journal    
DOI: 10.1016/S0257-8972(01)01153-7     Document Type: Article
Times cited : (25)

References (10)


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.