Growth of carbon nanotube arrays using nanosphere lithography and their application in field emission devices

Diamond and Related Materials

Volumn 19, Issue 7-9, 2010, Pages 914-917

  Mathur, A ^a   Roy, S S ^a   Hazra, Kiran S ^b   Misra, D S ^b   McLaughlin, J A ^a  

^a UNIVERSITY OF ULSTER   (United Kingdom)

^b INDIAN INSTITUTE OF TECHNOLOGY BOMBAY   (India)

Author keywords

Carbon nanotubes; Field emission; Plasma CVD

Indexed keywords

CARBON NANOTUBE ARRAY; CO CATALYSTS; DC SPUTTERING; FIELD EMISSION PROPERTY; IN-FIELD; IV CHARACTERISTICS; MICROWAVE PLASMA-ASSISTED CHEMICAL VAPOR DEPOSITION; NANO SPHERE LITHOGRAPHY; PATTERNED GROWTH; PERIODIC ARRAYS; PLASMA-CVD; RAMAN SPECTROSCOPIC STUDY; ULTRA-THIN;

CATALYSTS; COBALT; FIELD EMISSION; MONOLAYERS; NANOSPHERES; PLASMA DEPOSITION; RAMAN SPECTROSCOPY; SPECTROSCOPIC ANALYSIS;

CARBON NANOTUBES;

EID: 77955230887     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.diamond.2010.02.042     Document Type: Article

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