Molybdenum interlayers for nucleation enhancement in diamond CVD growth

Journal of Nanoscience and Nanotechnology

Volumn 10, Issue 4, 2010, Pages 2885-2891

  Buijnsters, J G ^a   Vazquez L ^b   Galindo, R Escobar ^c   Ter Meulen, J J ^a  

^a RADBOUD UNIVERSITY NIJMEGEN   (Netherlands)

^b INSTITUTO DE CIENCIA DE MATERIALES DE MADRID   (Spain)

^c CENTRO DE MICROANÁLISIS DE MATERIALES   (Spain)

Author keywords

Chemical vapour deposition; Diamond; Interlayer; Molybdenum; Nucleation

Indexed keywords

CHEMICAL VAPOUR DEPOSITION; DIAMOND CVD; FAST NUCLEATION; GRAIN SIZE; HIGH SUBSTRATE TEMPERATURE; HOT FILAMENT; INITIAL STAGES; INTERFACIAL VOIDS; INTERLAYER; LOW SUBSTRATE TEMPERATURE; METHANE CONCENTRATIONS; MICROCRYSTALLINE DIAMOND; NANOCRYSTALLINE DIAMOND FILMS; NCD FILMS; NUCLEATION DENSITIES; NUCLEATION LAYERS; ORDER OF MAGNITUDE; RMS ROUGHNESS; SILICON SUBSTRATES; SUBSTRATE MATERIAL; SURFACE COVERAGES; THICK LAYERS;

CHEMICAL VAPOR DEPOSITION; COMPOSITE FILMS; DIAMOND FILMS; DIAMONDS; GROWTH KINETICS; METHANATION; METHANE; MICROCRYSTALLINE SILICON; MOLYBDENUM; NANOCRYSTALLINE SILICON; NUCLEATION; PHOTORESISTS; STRUCTURAL DESIGN; STRUCTURAL OPTIMIZATION; SUBSTRATES; SURFACE PROPERTIES; SURFACE ROUGHNESS; SYNTHETIC DIAMONDS;

FILM GROWTH;

EID: 77954972991     PISSN: 15334880     EISSN: None     Source Type: Journal    
DOI: 10.1166/jnn.2010.1392     Document Type: Conference Paper

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