Nanocrystalline diamond growth on different substrates

Thin Solid Films

Volumn 515, Issue 3, 2006, Pages 1005-1010

  Kulisch, W ^a   Popov, C ^a   Vorlicek, V ^b   Gibson, P N ^c   Favaro, G ^d  

^a UNIVERSITY OF KASSEL   (Germany)

^b INSTITUTE OF PHYSICS   (Czech Republic)

^c JOINT RESEARCH CENTRE   (Italy)

^d CSM Instruments SA   (Switzerland)

Author keywords

Growth mechanisms; Mechanical properties; Nanocrystalline diamond; Nucleation mechanisms

Indexed keywords

AMORPHOUS MATERIALS; BORON COMPOUNDS; CHEMICAL VAPOR DEPOSITION; DIAMONDS; GROWTH KINETICS; SUBSTRATES; X RAY DIFFRACTION;

GROWTH MECHANISMS; MICROWAVE PLASMA CHEMICAL VAPOR DEPOSITION (MWCVD); NANOCRYSTALLINE DIAMOND GROWTH; NUCLEATION MECHANISMS;

NANOSTRUCTURED MATERIALS;

EID: 33750466896     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2006.07.163     Document Type: Article

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