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Volumn 6, Issue SUPPL. 1, 2009, Pages

A versatile system for large area coating of nanocomposite thin films

Author keywords

Clusters; DC discharges; HF discharges; Metal containing coatings; Nanocomposites; Nanotechnology; Particles; Plasma polymerization; Plasma enhanced chemical vapor deposition (PECVD)

Indexed keywords

CLUSTERS; DC DISCHARGES; DEPOSITION SYSTEMS; DISCHARGE PARAMETERS; GAS FLOWS; GAS PHASE CONDENSATION; HF DISCHARGES; HIGH DEPOSITION RATES; HOLLOW CATHODES; INORGANIC COMPOSITES; LARGE-AREA COATING; MATRIX; MATRIX MATERIALS; METAL NANOPARTICLES; NANOCOMPOSITE FILM; NANOCOMPOSITE THIN FILMS; NANOPARTICLE FILMS; ORGANIC PRECURSOR; PLASMA POLYMERS; PULSED DISCHARGE; SOURCE PARAMETERS; VACUUM ENVIRONMENT; VACUUM SYSTEM; VARIOUS SUBSTRATES; VERSATILE SYSTEM;

EID: 77954909957     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200932304     Document Type: Conference Paper
Times cited : (11)

References (16)
  • 12
    • 8344249614 scopus 로고    scopus 로고
    • R. d'Agostino, P. Favia, C. Oehr, M. R. Wertheimer, Eds., Wiley-VCH, Berlin
    • R. d'Agostino, P. Favia, C. Oehr, M. R. Wertheimer, Eds., "Plasma Process and Polymers", Wiley-VCH, Berlin 2005.
    • (2005) Plasma Process and Polymers


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.